Graphene or carbon nanotube devices with localized bottom gates and gate dielectric

Transistor devices having nanoscale material-based channels (e.g., carbon nanotube or graphene channels) and techniques for the fabrication thereof are provided. In one aspect, a transistor device is provided. The transistor device includes a substrate; an insulator on the substrate; a local bottom...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: JAMES BOWLER HANNON, AARON D FRANKLIN, SHU-JEN HAN, KATHERINE L SAENGER, ZHIHONG CHEN, GEORGE STOJAN TULEVSKI
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator JAMES BOWLER HANNON
AARON D FRANKLIN
SHU-JEN HAN
KATHERINE L SAENGER
ZHIHONG CHEN
GEORGE STOJAN TULEVSKI
description Transistor devices having nanoscale material-based channels (e.g., carbon nanotube or graphene channels) and techniques for the fabrication thereof are provided. In one aspect, a transistor device is provided. The transistor device includes a substrate; an insulator on the substrate; a local bottom gate embedded in the insulator, wherein a top surface of the gate is substantially coplanar with a surface of the insulator; a local gate dielectric on the bottom gate; a carbon-based nanostructure material over at least a portion of the local gate dielectric, wherein a portion of the carbon-based nanostructure material serves as a channel of the device; and conductive source and drain contacts to one or more portions of the carbon-based nanostructure material on opposing sides of the channel that serve as source and drain regions of the device.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_GB2510058A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>GB2510058A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_GB2510058A3</originalsourceid><addsrcrecordid>eNqFjUEKwjAQRbNxIeoZnAsIVSm41VLrXvdlMhltIGZCMip4eou4d_UfvAd_as5dxjRwZJAMhNlKhIhR9GEZHD89cYGX1wGCEAb_ZgdWVOUON9TRYXRfAuc5MGn2NDeTK4bCi9_OzPLYXprTipP0XBLS-Kd9d9jU66qqd_vt_-IDc_83dw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Graphene or carbon nanotube devices with localized bottom gates and gate dielectric</title><source>esp@cenet</source><creator>JAMES BOWLER HANNON ; AARON D FRANKLIN ; SHU-JEN HAN ; KATHERINE L SAENGER ; ZHIHONG CHEN ; GEORGE STOJAN TULEVSKI</creator><creatorcontrib>JAMES BOWLER HANNON ; AARON D FRANKLIN ; SHU-JEN HAN ; KATHERINE L SAENGER ; ZHIHONG CHEN ; GEORGE STOJAN TULEVSKI</creatorcontrib><description>Transistor devices having nanoscale material-based channels (e.g., carbon nanotube or graphene channels) and techniques for the fabrication thereof are provided. In one aspect, a transistor device is provided. The transistor device includes a substrate; an insulator on the substrate; a local bottom gate embedded in the insulator, wherein a top surface of the gate is substantially coplanar with a surface of the insulator; a local gate dielectric on the bottom gate; a carbon-based nanostructure material over at least a portion of the local gate dielectric, wherein a portion of the carbon-based nanostructure material serves as a channel of the device; and conductive source and drain contacts to one or more portions of the carbon-based nanostructure material on opposing sides of the channel that serve as source and drain regions of the device.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES ; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES ; NANOTECHNOLOGY ; PERFORMING OPERATIONS ; SEMICONDUCTOR DEVICES ; SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES ; TRANSPORTING</subject><creationdate>2014</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20140723&amp;DB=EPODOC&amp;CC=GB&amp;NR=2510058A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20140723&amp;DB=EPODOC&amp;CC=GB&amp;NR=2510058A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>JAMES BOWLER HANNON</creatorcontrib><creatorcontrib>AARON D FRANKLIN</creatorcontrib><creatorcontrib>SHU-JEN HAN</creatorcontrib><creatorcontrib>KATHERINE L SAENGER</creatorcontrib><creatorcontrib>ZHIHONG CHEN</creatorcontrib><creatorcontrib>GEORGE STOJAN TULEVSKI</creatorcontrib><title>Graphene or carbon nanotube devices with localized bottom gates and gate dielectric</title><description>Transistor devices having nanoscale material-based channels (e.g., carbon nanotube or graphene channels) and techniques for the fabrication thereof are provided. In one aspect, a transistor device is provided. The transistor device includes a substrate; an insulator on the substrate; a local bottom gate embedded in the insulator, wherein a top surface of the gate is substantially coplanar with a surface of the insulator; a local gate dielectric on the bottom gate; a carbon-based nanostructure material over at least a portion of the local gate dielectric, wherein a portion of the carbon-based nanostructure material serves as a channel of the device; and conductive source and drain contacts to one or more portions of the carbon-based nanostructure material on opposing sides of the channel that serve as source and drain regions of the device.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>MANUFACTURE OR TREATMENT OF NANOSTRUCTURES</subject><subject>MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES</subject><subject>NANOTECHNOLOGY</subject><subject>PERFORMING OPERATIONS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2014</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqFjUEKwjAQRbNxIeoZnAsIVSm41VLrXvdlMhltIGZCMip4eou4d_UfvAd_as5dxjRwZJAMhNlKhIhR9GEZHD89cYGX1wGCEAb_ZgdWVOUON9TRYXRfAuc5MGn2NDeTK4bCi9_OzPLYXprTipP0XBLS-Kd9d9jU66qqd_vt_-IDc_83dw</recordid><startdate>20140723</startdate><enddate>20140723</enddate><creator>JAMES BOWLER HANNON</creator><creator>AARON D FRANKLIN</creator><creator>SHU-JEN HAN</creator><creator>KATHERINE L SAENGER</creator><creator>ZHIHONG CHEN</creator><creator>GEORGE STOJAN TULEVSKI</creator><scope>EVB</scope></search><sort><creationdate>20140723</creationdate><title>Graphene or carbon nanotube devices with localized bottom gates and gate dielectric</title><author>JAMES BOWLER HANNON ; AARON D FRANKLIN ; SHU-JEN HAN ; KATHERINE L SAENGER ; ZHIHONG CHEN ; GEORGE STOJAN TULEVSKI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_GB2510058A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2014</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>MANUFACTURE OR TREATMENT OF NANOSTRUCTURES</topic><topic>MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES</topic><topic>NANOTECHNOLOGY</topic><topic>PERFORMING OPERATIONS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>JAMES BOWLER HANNON</creatorcontrib><creatorcontrib>AARON D FRANKLIN</creatorcontrib><creatorcontrib>SHU-JEN HAN</creatorcontrib><creatorcontrib>KATHERINE L SAENGER</creatorcontrib><creatorcontrib>ZHIHONG CHEN</creatorcontrib><creatorcontrib>GEORGE STOJAN TULEVSKI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>JAMES BOWLER HANNON</au><au>AARON D FRANKLIN</au><au>SHU-JEN HAN</au><au>KATHERINE L SAENGER</au><au>ZHIHONG CHEN</au><au>GEORGE STOJAN TULEVSKI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Graphene or carbon nanotube devices with localized bottom gates and gate dielectric</title><date>2014-07-23</date><risdate>2014</risdate><abstract>Transistor devices having nanoscale material-based channels (e.g., carbon nanotube or graphene channels) and techniques for the fabrication thereof are provided. In one aspect, a transistor device is provided. The transistor device includes a substrate; an insulator on the substrate; a local bottom gate embedded in the insulator, wherein a top surface of the gate is substantially coplanar with a surface of the insulator; a local gate dielectric on the bottom gate; a carbon-based nanostructure material over at least a portion of the local gate dielectric, wherein a portion of the carbon-based nanostructure material serves as a channel of the device; and conductive source and drain contacts to one or more portions of the carbon-based nanostructure material on opposing sides of the channel that serve as source and drain regions of the device.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_GB2510058A
source esp@cenet
subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES
NANOTECHNOLOGY
PERFORMING OPERATIONS
SEMICONDUCTOR DEVICES
SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
TRANSPORTING
title Graphene or carbon nanotube devices with localized bottom gates and gate dielectric
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-22T20%3A47%3A04IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=JAMES%20BOWLER%20HANNON&rft.date=2014-07-23&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EGB2510058A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true