Cleaning a stack of thin wafers

Apparatus for cleaning wafers in a stack comprising a multiplicity of wafers (Fig. 1; 10) comprises a horizontal trough 17 into which the stack of wafers is to be placed, the axis of the trough being perpendicular to the planes of the individual wafers; supports 12 within the trough to hold the wafe...

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Bibliographische Detailangaben

Hauptverfasser:	ANITA BORVE, POURIA HOMAYONIFAR
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CLEANING CLEANING IN GENERAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING
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