Fault detection and control methodologies for ion implantation processes

The present invention is generally directed to fault detection and control methodologies for ion implant processes, and a system for performing the same. In one embodiment, the method comprises performing a tuning process for an ion implant tool 10, said tuning process resulting in at least one tool...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ELFIDO COSS, PATRICK M COWAN
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY
Online-Zugang:	Volltext bestellen
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