A METHOD AND APPARATUS FOR THE CORPUSCULAR IRRADIATION OF A TARGET

Method and apparatus for particle irradiation of a target, wherein the anisotropic contrast deflection of an irradiation modulator for producing the exposure pattern is produced step by step, the magnitude of the potential difference between the electrodes of a comb electrode is being set, and the s...

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1. Verfasser: EBERHARD HAHN
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creator EBERHARD HAHN
description Method and apparatus for particle irradiation of a target, wherein the anisotropic contrast deflection of an irradiation modulator for producing the exposure pattern is produced step by step, the magnitude of the potential difference between the electrodes of a comb electrode is being set, and the structuring of a line probe is controlled by a control logic according to given specifications by utilization of potential setting patterns.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_GB2143079B</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>GB2143079B</sourcerecordid><originalsourceid>FETCH-epo_espacenet_GB2143079B3</originalsourceid><addsrcrecordid>eNrjZHByVPB1DfHwd1Fw9APigADHIMeQ0GAFN_8ghRAPVwVn_6CA0GDnUB_HIAXPoCBHF0_HEE9_PwV_NwVHhRDHIHfXEB4G1rTEnOJUXijNzSDv5hri7KGbWpAfn1pckJicmpdaEu_uZGRoYmxgbulkTFgFAC6KKf8</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>A METHOD AND APPARATUS FOR THE CORPUSCULAR IRRADIATION OF A TARGET</title><source>esp@cenet</source><creator>EBERHARD HAHN</creator><creatorcontrib>EBERHARD HAHN</creatorcontrib><description>Method and apparatus for particle irradiation of a target, wherein the anisotropic contrast deflection of an irradiation modulator for producing the exposure pattern is produced step by step, the magnitude of the potential difference between the electrodes of a comb electrode is being set, and the structuring of a line probe is controlled by a control logic according to given specifications by utilization of potential setting patterns.</description><edition>3</edition><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>1987</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19870507&amp;DB=EPODOC&amp;CC=GB&amp;NR=2143079B$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19870507&amp;DB=EPODOC&amp;CC=GB&amp;NR=2143079B$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>EBERHARD HAHN</creatorcontrib><title>A METHOD AND APPARATUS FOR THE CORPUSCULAR IRRADIATION OF A TARGET</title><description>Method and apparatus for particle irradiation of a target, wherein the anisotropic contrast deflection of an irradiation modulator for producing the exposure pattern is produced step by step, the magnitude of the potential difference between the electrodes of a comb electrode is being set, and the structuring of a line probe is controlled by a control logic according to given specifications by utilization of potential setting patterns.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1987</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHByVPB1DfHwd1Fw9APigADHIMeQ0GAFN_8ghRAPVwVn_6CA0GDnUB_HIAXPoCBHF0_HEE9_PwV_NwVHhRDHIHfXEB4G1rTEnOJUXijNzSDv5hri7KGbWpAfn1pckJicmpdaEu_uZGRoYmxgbulkTFgFAC6KKf8</recordid><startdate>19870507</startdate><enddate>19870507</enddate><creator>EBERHARD HAHN</creator><scope>EVB</scope></search><sort><creationdate>19870507</creationdate><title>A METHOD AND APPARATUS FOR THE CORPUSCULAR IRRADIATION OF A TARGET</title><author>EBERHARD HAHN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_GB2143079B3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1987</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>EBERHARD HAHN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>EBERHARD HAHN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>A METHOD AND APPARATUS FOR THE CORPUSCULAR IRRADIATION OF A TARGET</title><date>1987-05-07</date><risdate>1987</risdate><abstract>Method and apparatus for particle irradiation of a target, wherein the anisotropic contrast deflection of an irradiation modulator for producing the exposure pattern is produced step by step, the magnitude of the potential difference between the electrodes of a comb electrode is being set, and the structuring of a line probe is controlled by a control logic according to given specifications by utilization of potential setting patterns.</abstract><edition>3</edition><oa>free_for_read</oa></addata></record>
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subjects APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
title A METHOD AND APPARATUS FOR THE CORPUSCULAR IRRADIATION OF A TARGET
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-28T16%3A31%3A43IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=EBERHARD%20HAHN&rft.date=1987-05-07&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EGB2143079B%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true