PHOTOSENSITIVITY POLYMER LAYERS

1293026 Photo-sensitive materials AGFAGEVAERTAG 5 Nov 1970 [8 Nov 1969 8 May 1970] 52662/70 Headings C3B C3P and C3R [Also in Division G2] A photo-sensitive material contains a supported or self-supporting layer comprising an organic azide cross-linking agent and a polymer with groups which react wi...

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Bibliographische Detailangaben
Hauptverfasser:	ERICH WOLFF, GUNTHER KOLF, WOLFGANG LASSIG ECKART SEELIG
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS
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