PHOTOSENSITIVITY POLYMER LAYERS
1293026 Photo-sensitive materials AGFAGEVAERTAG 5 Nov 1970 [8 Nov 1969 8 May 1970] 52662/70 Headings C3B C3P and C3R [Also in Division G2] A photo-sensitive material contains a supported or self-supporting layer comprising an organic azide cross-linking agent and a polymer with groups which react wi...
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| creator | ERICH WOLFF GUNTHER KOLF WOLFGANG LASSIG ECKART SEELIG |
| description | 1293026 Photo-sensitive materials AGFAGEVAERTAG 5 Nov 1970 [8 Nov 1969 8 May 1970] 52662/70 Headings C3B C3P and C3R [Also in Division G2] A photo-sensitive material contains a supported or self-supporting layer comprising an organic azide cross-linking agent and a polymer with groups which react with the azide groups on exposure to light, the polymer being (i) a homopolymer or copolymer of an olefinically unsaturated monomer which has directly attached or attached via an ester, acetal, urethane, carbonyl, sulphonamide or sulphonyl urethane link to the main chain a benzene ring substituted by methyl or monosubstituted methyl groups, (ii) a polyester or polyether with OH groups which are completely or partially substituted via an ester, acetal or urethane link with a benzene ring as in (i) and (iii) a polyamide whose amide groups are completely or partially substituted by benzoyl groups having methyl or monosubstituted methyl groups. The material may also contain sensitizers such as Michler's ketone, naphthothiazolines, dyes, dimethylamine benzaldehyde or quinolizine-4- one. In examples, preferred polymers are vinyl alcohol polymer and copolymers containing mmethyl benzoyl, p-methyl phenylacetyl, p-ethyl benzoyl and 4-nitro-3-methylbenzoyl as groups in a side chain, epoxy resin with m-methyl benzoyl as side chain polyvinyl toluene, vinyl toluene/ styrene copolymer, a polyamide containing mmethyl benzoyl as a side chain and sulphochlorinated polyethylene containing m-toluidine groups. The polyvinyl alcohol derivatives are prepared by reacting polyvinyl alcohol with the appropriate acyl chloride in pyridine. Polyvinyl alcohol may be replaced (see reaction product in the description) by vinyl alcohol/ethylene copolymer, vinyl chloride/vinyl alcohol copolymer, epoxy resin of epichlorohydrin and 2,2-bis-(4- hydroxyphenyl) - propane. The polyamide derivative is prepared by reacting a polyamide of diethylene triamine and adipic acid with mmethylbenzoic acid chloride in water. The sulphochlorinated polyethylene derivative is prepared by reacting the sulphochlorinated polyethylene with m-toluidine in toluene. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_GB1293026A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>GB1293026A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_GB1293026A3</originalsourceid><addsrcrecordid>eNrjZJAP8PAP8Q929Qv2DPEM8wyJVAjw94n0dQ1S8HGMdA0K5mFgTUvMKU7lhdLcDPJuriHOHrqpBfnxqcUFicmpeakl8e5OhkaWxgZGZo7GhFUAAI7fIU0</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>PHOTOSENSITIVITY POLYMER LAYERS</title><source>esp@cenet</source><creator>ERICH WOLFF ; GUNTHER KOLF ; WOLFGANG LASSIG ECKART SEELIG</creator><creatorcontrib>ERICH WOLFF ; GUNTHER KOLF ; WOLFGANG LASSIG ECKART SEELIG</creatorcontrib><description>1293026 Photo-sensitive materials AGFAGEVAERTAG 5 Nov 1970 [8 Nov 1969 8 May 1970] 52662/70 Headings C3B C3P and C3R [Also in Division G2] A photo-sensitive material contains a supported or self-supporting layer comprising an organic azide cross-linking agent and a polymer with groups which react with the azide groups on exposure to light, the polymer being (i) a homopolymer or copolymer of an olefinically unsaturated monomer which has directly attached or attached via an ester, acetal, urethane, carbonyl, sulphonamide or sulphonyl urethane link to the main chain a benzene ring substituted by methyl or monosubstituted methyl groups, (ii) a polyester or polyether with OH groups which are completely or partially substituted via an ester, acetal or urethane link with a benzene ring as in (i) and (iii) a polyamide whose amide groups are completely or partially substituted by benzoyl groups having methyl or monosubstituted methyl groups. The material may also contain sensitizers such as Michler's ketone, naphthothiazolines, dyes, dimethylamine benzaldehyde or quinolizine-4- one. In examples, preferred polymers are vinyl alcohol polymer and copolymers containing mmethyl benzoyl, p-methyl phenylacetyl, p-ethyl benzoyl and 4-nitro-3-methylbenzoyl as groups in a side chain, epoxy resin with m-methyl benzoyl as side chain polyvinyl toluene, vinyl toluene/ styrene copolymer, a polyamide containing mmethyl benzoyl as a side chain and sulphochlorinated polyethylene containing m-toluidine groups. The polyvinyl alcohol derivatives are prepared by reacting polyvinyl alcohol with the appropriate acyl chloride in pyridine. Polyvinyl alcohol may be replaced (see reaction product in the description) by vinyl alcohol/ethylene copolymer, vinyl chloride/vinyl alcohol copolymer, epoxy resin of epichlorohydrin and 2,2-bis-(4- hydroxyphenyl) - propane. The polyamide derivative is prepared by reacting a polyamide of diethylene triamine and adipic acid with mmethylbenzoic acid chloride in water. The sulphochlorinated polyethylene derivative is prepared by reacting the sulphochlorinated polyethylene with m-toluidine in toluene.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CHEMISTRY ; CINEMATOGRAPHY ; COMPOSITIONS BASED THEREON ; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ; ELECTROGRAPHY ; HOLOGRAPHY ; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS ; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS ; MATERIALS THEREFOR ; METALLURGY ; ORGANIC MACROMOLECULAR COMPOUNDS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS</subject><creationdate>1972</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19721018&DB=EPODOC&CC=GB&NR=1293026A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19721018&DB=EPODOC&CC=GB&NR=1293026A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ERICH WOLFF</creatorcontrib><creatorcontrib>GUNTHER KOLF</creatorcontrib><creatorcontrib>WOLFGANG LASSIG ECKART SEELIG</creatorcontrib><title>PHOTOSENSITIVITY POLYMER LAYERS</title><description>1293026 Photo-sensitive materials AGFAGEVAERTAG 5 Nov 1970 [8 Nov 1969 8 May 1970] 52662/70 Headings C3B C3P and C3R [Also in Division G2] A photo-sensitive material contains a supported or self-supporting layer comprising an organic azide cross-linking agent and a polymer with groups which react with the azide groups on exposure to light, the polymer being (i) a homopolymer or copolymer of an olefinically unsaturated monomer which has directly attached or attached via an ester, acetal, urethane, carbonyl, sulphonamide or sulphonyl urethane link to the main chain a benzene ring substituted by methyl or monosubstituted methyl groups, (ii) a polyester or polyether with OH groups which are completely or partially substituted via an ester, acetal or urethane link with a benzene ring as in (i) and (iii) a polyamide whose amide groups are completely or partially substituted by benzoyl groups having methyl or monosubstituted methyl groups. The material may also contain sensitizers such as Michler's ketone, naphthothiazolines, dyes, dimethylamine benzaldehyde or quinolizine-4- one. In examples, preferred polymers are vinyl alcohol polymer and copolymers containing mmethyl benzoyl, p-methyl phenylacetyl, p-ethyl benzoyl and 4-nitro-3-methylbenzoyl as groups in a side chain, epoxy resin with m-methyl benzoyl as side chain polyvinyl toluene, vinyl toluene/ styrene copolymer, a polyamide containing mmethyl benzoyl as a side chain and sulphochlorinated polyethylene containing m-toluidine groups. The polyvinyl alcohol derivatives are prepared by reacting polyvinyl alcohol with the appropriate acyl chloride in pyridine. Polyvinyl alcohol may be replaced (see reaction product in the description) by vinyl alcohol/ethylene copolymer, vinyl chloride/vinyl alcohol copolymer, epoxy resin of epichlorohydrin and 2,2-bis-(4- hydroxyphenyl) - propane. The polyamide derivative is prepared by reacting a polyamide of diethylene triamine and adipic acid with mmethylbenzoic acid chloride in water. The sulphochlorinated polyethylene derivative is prepared by reacting the sulphochlorinated polyethylene with m-toluidine in toluene.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>COMPOSITIONS OF MACROMOLECULAR COMPOUNDS</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><subject>USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1972</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJAP8PAP8Q929Qv2DPEM8wyJVAjw94n0dQ1S8HGMdA0K5mFgTUvMKU7lhdLcDPJuriHOHrqpBfnxqcUFicmpeakl8e5OhkaWxgZGZo7GhFUAAI7fIU0</recordid><startdate>19721018</startdate><enddate>19721018</enddate><creator>ERICH WOLFF</creator><creator>GUNTHER KOLF</creator><creator>WOLFGANG LASSIG ECKART SEELIG</creator><scope>EVB</scope></search><sort><creationdate>19721018</creationdate><title>PHOTOSENSITIVITY POLYMER LAYERS</title><author>ERICH WOLFF ; GUNTHER KOLF ; WOLFGANG LASSIG ECKART SEELIG</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_GB1293026A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1972</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>COMPOSITIONS OF MACROMOLECULAR COMPOUNDS</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><topic>USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS</topic><toplevel>online_resources</toplevel><creatorcontrib>ERICH WOLFF</creatorcontrib><creatorcontrib>GUNTHER KOLF</creatorcontrib><creatorcontrib>WOLFGANG LASSIG ECKART SEELIG</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>ERICH WOLFF</au><au>GUNTHER KOLF</au><au>WOLFGANG LASSIG ECKART SEELIG</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PHOTOSENSITIVITY POLYMER LAYERS</title><date>1972-10-18</date><risdate>1972</risdate><abstract>1293026 Photo-sensitive materials AGFAGEVAERTAG 5 Nov 1970 [8 Nov 1969 8 May 1970] 52662/70 Headings C3B C3P and C3R [Also in Division G2] A photo-sensitive material contains a supported or self-supporting layer comprising an organic azide cross-linking agent and a polymer with groups which react with the azide groups on exposure to light, the polymer being (i) a homopolymer or copolymer of an olefinically unsaturated monomer which has directly attached or attached via an ester, acetal, urethane, carbonyl, sulphonamide or sulphonyl urethane link to the main chain a benzene ring substituted by methyl or monosubstituted methyl groups, (ii) a polyester or polyether with OH groups which are completely or partially substituted via an ester, acetal or urethane link with a benzene ring as in (i) and (iii) a polyamide whose amide groups are completely or partially substituted by benzoyl groups having methyl or monosubstituted methyl groups. The material may also contain sensitizers such as Michler's ketone, naphthothiazolines, dyes, dimethylamine benzaldehyde or quinolizine-4- one. In examples, preferred polymers are vinyl alcohol polymer and copolymers containing mmethyl benzoyl, p-methyl phenylacetyl, p-ethyl benzoyl and 4-nitro-3-methylbenzoyl as groups in a side chain, epoxy resin with m-methyl benzoyl as side chain polyvinyl toluene, vinyl toluene/ styrene copolymer, a polyamide containing mmethyl benzoyl as a side chain and sulphochlorinated polyethylene containing m-toluidine groups. The polyvinyl alcohol derivatives are prepared by reacting polyvinyl alcohol with the appropriate acyl chloride in pyridine. Polyvinyl alcohol may be replaced (see reaction product in the description) by vinyl alcohol/ethylene copolymer, vinyl chloride/vinyl alcohol copolymer, epoxy resin of epichlorohydrin and 2,2-bis-(4- hydroxyphenyl) - propane. The polyamide derivative is prepared by reacting a polyamide of diethylene triamine and adipic acid with mmethylbenzoic acid chloride in water. The sulphochlorinated polyethylene derivative is prepared by reacting the sulphochlorinated polyethylene with m-toluidine in toluene.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS |
| title | PHOTOSENSITIVITY POLYMER LAYERS |
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