PROCEDE DE PREPARATION D'UN TAMPON A POLIR CONTENANT DU SILICATE

The method provides a method of preparing a silicate-containing polishing pad useful for polishing at least one of semiconductor, magnetic and optical substrates. The method includes introducing a feed stream of gas-filled polymeric microelements into a gas jet. The polymeric microelements have vari...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	RILEY SHAWN, WANK ANDREW, R, SO JOSEPH, K, GARGIONE ROBERT, GAZZE MARK, E, DROP DAVID, BANH MAI TIEU, ALDEN DONNA, M
Format:	Patent
Sprache:	fre
Schlagworte:	DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING TRANSPORTING
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