Field effect transistor structure with insulated grid

The transistor includes a channel region which extends longitudinally between the drain and source, under the grid (6) of the transistor. This channel region includes several longitudinal depressions (8a). The depressions (8a) are filled with a material from the grid region, so that the grid materia...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
1. Verfasser: HAOND MICHEL
Format: Patent
Sprache:eng ; fre
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!