TRANSISTOR A EFFET DE CHAMP A SUPRACONDUCTEUR
Field effect transistor comprising, on a substrate (1), a layer (2) of semiconductor material incorporating natural or artificial inclusions (20, 21) made of superconducting material. The source, drain and grid electrodes (3, 4, 5) are produced on this layer (2). Applications: field-effect transisto...
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creator | TYC STEPHANE SCHUHL ALAIN |
description | Field effect transistor comprising, on a substrate (1), a layer (2) of semiconductor material incorporating natural or artificial inclusions (20, 21) made of superconducting material. The source, drain and grid electrodes (3, 4, 5) are produced on this layer (2).
Applications: field-effect transistors with low grid-control voltage. |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_FR2666175B1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>FR2666175B1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_FR2666175B13</originalsourceid><addsrcrecordid>eNrjZNANCXL0C_YMDvEPUnBUcHVzcw1RcHFVcPZw9A0ACgSHBgQ5Ovv7uYQ6h7iGBvEwsKYl5hSn8kJpbgYFoAZnD93Ugvz41OKCxOTUvNSSeLcgIzMzM0NzUydDYyKUAABoIiUE</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>TRANSISTOR A EFFET DE CHAMP A SUPRACONDUCTEUR</title><source>esp@cenet</source><creator>TYC STEPHANE ; SCHUHL ALAIN</creator><creatorcontrib>TYC STEPHANE ; SCHUHL ALAIN</creatorcontrib><description>Field effect transistor comprising, on a substrate (1), a layer (2) of semiconductor material incorporating natural or artificial inclusions (20, 21) made of superconducting material. The source, drain and grid electrodes (3, 4, 5) are produced on this layer (2).
Applications: field-effect transistors with low grid-control voltage.</description><edition>5</edition><language>fre</language><subject>ELECTRICITY</subject><creationdate>1992</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19921016&DB=EPODOC&CC=FR&NR=2666175B1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19921016&DB=EPODOC&CC=FR&NR=2666175B1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TYC STEPHANE</creatorcontrib><creatorcontrib>SCHUHL ALAIN</creatorcontrib><title>TRANSISTOR A EFFET DE CHAMP A SUPRACONDUCTEUR</title><description>Field effect transistor comprising, on a substrate (1), a layer (2) of semiconductor material incorporating natural or artificial inclusions (20, 21) made of superconducting material. The source, drain and grid electrodes (3, 4, 5) are produced on this layer (2).
Applications: field-effect transistors with low grid-control voltage.</description><subject>ELECTRICITY</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1992</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNANCXL0C_YMDvEPUnBUcHVzcw1RcHFVcPZw9A0ACgSHBgQ5Ovv7uYQ6h7iGBvEwsKYl5hSn8kJpbgYFoAZnD93Ugvz41OKCxOTUvNSSeLcgIzMzM0NzUydDYyKUAABoIiUE</recordid><startdate>19921016</startdate><enddate>19921016</enddate><creator>TYC STEPHANE</creator><creator>SCHUHL ALAIN</creator><scope>EVB</scope></search><sort><creationdate>19921016</creationdate><title>TRANSISTOR A EFFET DE CHAMP A SUPRACONDUCTEUR</title><author>TYC STEPHANE ; SCHUHL ALAIN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_FR2666175B13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>fre</language><creationdate>1992</creationdate><topic>ELECTRICITY</topic><toplevel>online_resources</toplevel><creatorcontrib>TYC STEPHANE</creatorcontrib><creatorcontrib>SCHUHL ALAIN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>TYC STEPHANE</au><au>SCHUHL ALAIN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>TRANSISTOR A EFFET DE CHAMP A SUPRACONDUCTEUR</title><date>1992-10-16</date><risdate>1992</risdate><abstract>Field effect transistor comprising, on a substrate (1), a layer (2) of semiconductor material incorporating natural or artificial inclusions (20, 21) made of superconducting material. The source, drain and grid electrodes (3, 4, 5) are produced on this layer (2).
Applications: field-effect transistors with low grid-control voltage.</abstract><edition>5</edition><oa>free_for_read</oa></addata></record> |
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subjects | ELECTRICITY |
title | TRANSISTOR A EFFET DE CHAMP A SUPRACONDUCTEUR |
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