ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD

To provide an actinic ray-sensitive or radiation-sensitive resin composition that enables formation of a pattern excellent in CDU in ultrafine pattern formation and that, even after a lapse of time from the preparation, enables formation of a pattern excellent in CDU, a resist film, a pattern forming method, and a method for producing an electronic device that use the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition contains a compound (C) represented by a formula (Q1) and an acid-decomposable resin (A),wherein Ar1 represents an aromatic group, W1 represents an organic group, X1 represents a linking group including at least one selected from the group consisting of -O-, -S-, -C(=O)-, - S(=O)-, and -S(=O)2-, Y1 represents an electron-withdrawing group, Z1 represents a halogen atom, M+ represents a cation, k1 represents an integer of 1 or more, k2 represents an integer of 1 or more, provided that the group represented by -X1-W1- does not include *1-O-C(=O)-*2, *1 and *2 represent bonding sites, and *1 is a bonding site to Ar1.