A SYSTEM FOR USE IN A LITHOGRAPHIC APPARATUS

A system for use in a lithographic apparatus comprises: a substrate table; another device; and at least one deformable partition. The substrate table (for example a wafer stage) is arranged to support a substrate. The system is configurable in a first configuration such that a surface of the device...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	DE HOOGH, Joost, VAN DEN AKKER, Emericus, Antoon, Theodorus, DE VRIES, Sjoerd, Frans, LABETSKI, Dzmitry, HUANG, Zhuangxiong, HAZARI, Syed Aaquib
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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