COPOLYMER AND HOT MELT MATERIALS COMPRISING SAID COPOLYMER
The present application is directed to a copolymer obtained by free radical polymerization, said copolymer comprising, based on the total weight of monomers:from 0.1 to 10 wt.% of a) at least one co-polymerizable photoinitiator in accordance with Formula (I):wherein: R1 is NH, CH2, S or O;R2 to R9 a...
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| creator | Roschkowski, Thomas Taden, Andreas Schneider, Anja Arnold, Moritz |
| description | The present application is directed to a copolymer obtained by free radical polymerization, said copolymer comprising, based on the total weight of monomers:from 0.1 to 10 wt.% of a) at least one co-polymerizable photoinitiator in accordance with Formula (I):wherein: R1 is NH, CH2, S or O;R2 to R9 are independently selected from H, OH, SH, halide, CN, C1-C6 alkyl, C1-C6 alkoxy, C1-C12 alkoxyalkyl, COOH, SR10, COOR10, N(R10)2 or N(R10)3Q;each R10 is independently selected from C1-C6 alkyl or C6-C18 aryl; and,Q is halide, acetate, phosphate, sulphate or nitrate,subject to the proviso that j of the radicals R2 to R9 are a radical possessing ethylenic unsaturation, wherein j is an integer of from 1 to 3, preferably 1 or 2; and,from 90 to 99.9 wt.% of b) at least one ethylenically unsaturated non-ionic monomer which does not bear an epoxide group or a moiety decomposable under photo-irradiation to form a radical. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP4386019A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP4386019A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP4386019A13</originalsourceid><addsrcrecordid>eNrjZLBy9g_w94n0dQ1ScPRzUfDwD1HwdfUBEo4hrkGejj7BCs7-vgFBnsGefu4KwY6eLgpwDTwMrGmJOcWpvFCam0HBzTXE2UM3tSA_PrW4IDE5NS-1JN41wMTYwszA0NLR0JgIJQBzJyjJ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>COPOLYMER AND HOT MELT MATERIALS COMPRISING SAID COPOLYMER</title><source>esp@cenet</source><creator>Roschkowski, Thomas ; Taden, Andreas ; Schneider, Anja ; Arnold, Moritz</creator><creatorcontrib>Roschkowski, Thomas ; Taden, Andreas ; Schneider, Anja ; Arnold, Moritz</creatorcontrib><description>The present application is directed to a copolymer obtained by free radical polymerization, said copolymer comprising, based on the total weight of monomers:from 0.1 to 10 wt.% of a) at least one co-polymerizable photoinitiator in accordance with Formula (I):wherein: R1 is NH, CH2, S or O;R2 to R9 are independently selected from H, OH, SH, halide, CN, C1-C6 alkyl, C1-C6 alkoxy, C1-C12 alkoxyalkyl, COOH, SR10, COOR10, N(R10)2 or N(R10)3Q;each R10 is independently selected from C1-C6 alkyl or C6-C18 aryl; and,Q is halide, acetate, phosphate, sulphate or nitrate,subject to the proviso that j of the radicals R2 to R9 are a radical possessing ethylenic unsaturation, wherein j is an integer of from 1 to 3, preferably 1 or 2; and,from 90 to 99.9 wt.% of b) at least one ethylenically unsaturated non-ionic monomer which does not bear an epoxide group or a moiety decomposable under photo-irradiation to form a radical.</description><language>eng ; fre ; ger</language><subject>ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE ; ADHESIVES ; CHEMICAL PAINT OR INK REMOVERS ; CHEMISTRY ; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS ; COMPOSITIONS BASED THEREON ; CORRECTING FLUIDS ; DYES ; FILLING PASTES ; INKS ; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL ; ORGANIC MACROMOLECULAR COMPOUNDS ; PAINTS ; PASTES OR SOLIDS FOR COLOURING OR PRINTING ; POLISHES ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; USE OF MATERIALS AS ADHESIVES ; USE OF MATERIALS THEREFOR ; WOODSTAINS</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240619&DB=EPODOC&CC=EP&NR=4386019A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240619&DB=EPODOC&CC=EP&NR=4386019A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Roschkowski, Thomas</creatorcontrib><creatorcontrib>Taden, Andreas</creatorcontrib><creatorcontrib>Schneider, Anja</creatorcontrib><creatorcontrib>Arnold, Moritz</creatorcontrib><title>COPOLYMER AND HOT MELT MATERIALS COMPRISING SAID COPOLYMER</title><description>The present application is directed to a copolymer obtained by free radical polymerization, said copolymer comprising, based on the total weight of monomers:from 0.1 to 10 wt.% of a) at least one co-polymerizable photoinitiator in accordance with Formula (I):wherein: R1 is NH, CH2, S or O;R2 to R9 are independently selected from H, OH, SH, halide, CN, C1-C6 alkyl, C1-C6 alkoxy, C1-C12 alkoxyalkyl, COOH, SR10, COOR10, N(R10)2 or N(R10)3Q;each R10 is independently selected from C1-C6 alkyl or C6-C18 aryl; and,Q is halide, acetate, phosphate, sulphate or nitrate,subject to the proviso that j of the radicals R2 to R9 are a radical possessing ethylenic unsaturation, wherein j is an integer of from 1 to 3, preferably 1 or 2; and,from 90 to 99.9 wt.% of b) at least one ethylenically unsaturated non-ionic monomer which does not bear an epoxide group or a moiety decomposable under photo-irradiation to form a radical.</description><subject>ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE</subject><subject>ADHESIVES</subject><subject>CHEMICAL PAINT OR INK REMOVERS</subject><subject>CHEMISTRY</subject><subject>COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>CORRECTING FLUIDS</subject><subject>DYES</subject><subject>FILLING PASTES</subject><subject>INKS</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>PAINTS</subject><subject>PASTES OR SOLIDS FOR COLOURING OR PRINTING</subject><subject>POLISHES</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><subject>USE OF MATERIALS AS ADHESIVES</subject><subject>USE OF MATERIALS THEREFOR</subject><subject>WOODSTAINS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLBy9g_w94n0dQ1ScPRzUfDwD1HwdfUBEo4hrkGejj7BCs7-vgFBnsGefu4KwY6eLgpwDTwMrGmJOcWpvFCam0HBzTXE2UM3tSA_PrW4IDE5NS-1JN41wMTYwszA0NLR0JgIJQBzJyjJ</recordid><startdate>20240619</startdate><enddate>20240619</enddate><creator>Roschkowski, Thomas</creator><creator>Taden, Andreas</creator><creator>Schneider, Anja</creator><creator>Arnold, Moritz</creator><scope>EVB</scope></search><sort><creationdate>20240619</creationdate><title>COPOLYMER AND HOT MELT MATERIALS COMPRISING SAID COPOLYMER</title><author>Roschkowski, Thomas ; Taden, Andreas ; Schneider, Anja ; Arnold, Moritz</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP4386019A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2024</creationdate><topic>ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE</topic><topic>ADHESIVES</topic><topic>CHEMICAL PAINT OR INK REMOVERS</topic><topic>CHEMISTRY</topic><topic>COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>CORRECTING FLUIDS</topic><topic>DYES</topic><topic>FILLING PASTES</topic><topic>INKS</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>PAINTS</topic><topic>PASTES OR SOLIDS FOR COLOURING OR PRINTING</topic><topic>POLISHES</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><topic>USE OF MATERIALS AS ADHESIVES</topic><topic>USE OF MATERIALS THEREFOR</topic><topic>WOODSTAINS</topic><toplevel>online_resources</toplevel><creatorcontrib>Roschkowski, Thomas</creatorcontrib><creatorcontrib>Taden, Andreas</creatorcontrib><creatorcontrib>Schneider, Anja</creatorcontrib><creatorcontrib>Arnold, Moritz</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Roschkowski, Thomas</au><au>Taden, Andreas</au><au>Schneider, Anja</au><au>Arnold, Moritz</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>COPOLYMER AND HOT MELT MATERIALS COMPRISING SAID COPOLYMER</title><date>2024-06-19</date><risdate>2024</risdate><abstract>The present application is directed to a copolymer obtained by free radical polymerization, said copolymer comprising, based on the total weight of monomers:from 0.1 to 10 wt.% of a) at least one co-polymerizable photoinitiator in accordance with Formula (I):wherein: R1 is NH, CH2, S or O;R2 to R9 are independently selected from H, OH, SH, halide, CN, C1-C6 alkyl, C1-C6 alkoxy, C1-C12 alkoxyalkyl, COOH, SR10, COOR10, N(R10)2 or N(R10)3Q;each R10 is independently selected from C1-C6 alkyl or C6-C18 aryl; and,Q is halide, acetate, phosphate, sulphate or nitrate,subject to the proviso that j of the radicals R2 to R9 are a radical possessing ethylenic unsaturation, wherein j is an integer of from 1 to 3, preferably 1 or 2; and,from 90 to 99.9 wt.% of b) at least one ethylenically unsaturated non-ionic monomer which does not bear an epoxide group or a moiety decomposable under photo-irradiation to form a radical.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE ADHESIVES CHEMICAL PAINT OR INK REMOVERS CHEMISTRY COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS COMPOSITIONS BASED THEREON CORRECTING FLUIDS DYES FILLING PASTES INKS MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL ORGANIC MACROMOLECULAR COMPOUNDS PAINTS PASTES OR SOLIDS FOR COLOURING OR PRINTING POLISHES THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF MATERIALS AS ADHESIVES USE OF MATERIALS THEREFOR WOODSTAINS |
| title | COPOLYMER AND HOT MELT MATERIALS COMPRISING SAID COPOLYMER |
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