TRANSFORMER COUPLED PLASMA SOURCE DESIGN FOR THIN DIELECTRIC FILM DEPOSITION

An apparatus, comprising: a process chamber, wherein the process chamber comprises: a window, wherein the window comprises a dielectric material that is transmissive to radio frequency (RF) energy, wherein the window has a first side and a second side opposite the first side; a collar assembly havin...

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Hauptverfasser: MCKERROW, Andrew John, GUI, Zhe, BATZER, Rachel E, CHEN, Lee, GUO, Tongtong, GONG, Bo, KHOJASTEH, Malak, QIU, Huatan, JUAREZ, Francisco J
Format: Patent
Sprache:eng ; fre ; ger
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