MULTI-SECTIONAL PLASMA CONFINEMENT RING STRUCTURE

A confinement ring for use in a plasma processing chamber includes an upper horizontal section, an upper vertical section, a mid-section, a lower vertical section, a lower horizontal section and a vertical extension. The upper horizontal section extends between an inner upper radius and a first oute...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KELLOGG, Michael C, MARAKHTANOV, Alexei
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY
Online-Zugang:	Volltext bestellen
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