STRESS AND OVERLAY MANAGEMENT FOR SEMICONDUCTOR PROCESSING
Provided are methods of reducing the stress of a semiconductor wafer. A wafer map of a free-standing wafer is created using metrology tools. The wafer map is then converted into a power spectral density (PSD) using a spatial frequency scale. The fundamental component of bow is then compensated with...
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Format: | Patent |
Sprache: | eng ; fre ; ger |
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