MULTIPLE REFLECTOMETRY FOR MEASURING ETCH PARAMETERS

A system includes a memory, and at least one processing device, operatively coupled to the memory, to facilitate an etch recipe development process by performing operations including obtaining, from an optical detector, first material thickness data for a first material and second material thickness...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ERICKSON, Blake, KUTNEY, Michael, ZHU, Zhaozhao, BARMAN, Soumendra, SANPEDRO, Michelle, BERDING, Keith, RAO, Suresh Polali Narayana
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS SEMICONDUCTOR DEVICES TESTING
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