METROLOGY AND CONTROL SYSTEM

A metrology and control system (100, 400, 500) for a laser beam in an EUV radiation source is disclosed. The system comprises an optical pickup (405, 540, 550) configured to measure a forward beam (410, 510, 520, 530) directed towards a target location (420, 535) and a return beam (415) reflected fr...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	VAN DER HOEVEN, Saartje, Willemijn, VAN DE CAMP, Thijs, WAIBOER, Rob, BEEKER, Willem, Paul
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY X-RAY TECHNIQUE
Online-Zugang:	Volltext bestellen
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