MEASUREMENT DEVICE, LITHOGRAPHY SYSTEM AND EXPOSURE APPARATUS, AND CONTROL METHOD, OVERLAY MEASUREMENT METHOD AND DEVICE MANUFACTURING METHOD

A measurement device (100) is provided with: a slider (10) which holds a substrate (W) and which is movable parallel to the XY plane; a drive system that drives the slider; a position measurement system (30) which emits a plurality of beams from a head section (32) to a measurement surface in which grating section (RG1) are provided on the slider, which receives respective return beams of the plurality of beams from the measurement surface, and which is capable of measuring position information in at least directions of three degrees of freedom including the absolute position coordinates of the slider; a mark detection system (MDS) that detects a mark on the substrate; and a controller which detects the plurality of marks on the substrate using the mark detection system while controlling the drive of the slider, and which obtains the absolute position coordinates of each mark based on the detection result of each mark and measurement information by the position measurement system at the time of detection.