SUBSTRATE AND METHOD FOR PRODUCING THE SAME

Proposed herein is a method for producing a substrate suitable for mask blanks for EUVL and the method being capable of suppressing a concave defect having a depth of less than 5 nm.The present invention provides a method for producing a substrate in which final polishing is performed by a polishing...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	TAKEUCHI, Masaki, HARADA, Daijitsu, MATSUI, Harunobu, YARITA, Naoki
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING TRANSPORTING
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