CLEANING COMPOSITION, METHOD OF CLEANING METAL-CONTAINING FILM AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

Provided are a cleaning composition for removing residues on surfaces, a method of cleaning a metal-containing film by using the same, and a method of manufacturing a semiconductor device by using the same. The cleaning composition comprises a solvent (water), a cleaning accelerator and does not com...

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Bibliographische Detailangaben
Hauptverfasser:	KIM, Jiwon, OH, Jungmin, KIM, Sungmin, CHOI, Byoungki, LEE, Hyosan, HAM, Cheol, HWANG, Kyuyoung, KANG, Byungjoon, KIM, Hwang Suk
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES BASIC ELECTRIC ELEMENTS CANDLES CHEMISTRY DETERGENT COMPOSITIONS DETERGENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FATTY ACIDS THEREFROM METALLURGY RECOVERY OF GLYCEROL RESIN SOAPS SEMICONDUCTOR DEVICES SOAP OR SOAP-MAKING USE OF SINGLE SUBSTANCES AS DETERGENTS
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Beschreibung
Zusammenfassung:	Provided are a cleaning composition for removing residues on surfaces, a method of cleaning a metal-containing film by using the same, and a method of manufacturing a semiconductor device by using the same. The cleaning composition comprises a solvent (water), a cleaning accelerator and does not comprise an oxidant.