METHOD AND APPARATUS FOR EUV MASK INSPECTION

A method for producing a protective buffer flow in an EUV light source and an EUV mask inspection apparatus are provided. The method includes directing light along a light path from the EUV light source toward a collector. A first buffer gas from a buffer gas injector is injected through a plurality...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	AHR, Brian, BORISOVICH ZVEDENUK, Leonid, WILSON, Lauren, KUCHER, Lubomyr, BYKANOV, Alexander, ALEXANDROVICH DEMINSKII, Maksim, TSIGUTKIN, Konstantin, VLADIMIROVICH LEBEDEV, Aleksandr, EVGENIEVICH STEPANOV, Andrey, MILSHTEIN, Erel
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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