IMPROVED SYNTHESIS PROCESS OF THIN FILMS BY VAPOUR DEPOSITION

The present invention relates to a process for obtaining thin films from powders of inorganic and organic materials by vapour deposition, characterized in that the crucible used to heat the powders is pre-heated above their sublimation temperature and in that this powder is fed in µg/pulse quantitie...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	RODKEY, Nathan Jacques, HUISMAN, Bas Antonius Hendrikus, BOLINK, Hendrik Jan
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The present invention relates to a process for obtaining thin films from powders of inorganic and organic materials by vapour deposition, characterized in that the crucible used to heat the powders is pre-heated above their sublimation temperature and in that this powder is fed in µg/pulse quantities to the pre-heated crucible by a feeder system. Furthermore, the invention is related to a device to carry out this process.