MATERIAL COMPRISING A STACK WITH A THIN ZINC-BASED DIELECTRIC OXIDE UNDERLAYER AND METHOD FOR DEPOSITING SAID MATERIAL
The invention relates to a material comprising a substrate (30) coated on one face (29) with a stack of thin layers (14) comprising at least one metal functional layer (140) and further comprising: - an oxide underlayer based on zinc, ZnO (129), between 0.3 and 4.4 nm; - a mixed oxide dielectric und...
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creator | GUIMARD, Denis ORVEN, Matthieu BARRES, Thomas |
description | The invention relates to a material comprising a substrate (30) coated on one face (29) with a stack of thin layers (14) comprising at least one metal functional layer (140) and further comprising: - an oxide underlayer based on zinc, ZnO (129), between 0.3 and 4.4 nm; - a mixed oxide dielectric underlayer based on zinc and tin, SniZnjO (128) between 3.0 and 50.0 nm; - a nitride underlayer based on silicon, Si3N4 (127), or silicon-zirconium, SixNyZrz, between 5.0 and 30.0 nm; - a capping layer (150) of titanium oxide, TiOx, located on and in contact with said functional layer (140). |
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- a mixed oxide dielectric underlayer based on zinc and tin, SniZnjO (128) between 3.0 and 50.0 nm; - a nitride underlayer based on silicon, Si3N4 (127), or silicon-zirconium, SixNyZrz, between 5.0 and 30.0 nm; - a capping layer (150) of titanium oxide, TiOx, located on and in contact with said functional layer (140).</description><language>eng ; fre ; ger</language><subject>CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS ; CHEMISTRY ; GLASS ; JOINING GLASS TO GLASS OR OTHER MATERIALS ; METALLURGY ; MINERAL OR SLAG WOOL ; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS ; SURFACE TREATMENT OF GLASS</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20241106&DB=EPODOC&CC=EP&NR=4263455B1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20241106&DB=EPODOC&CC=EP&NR=4263455B1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>GUIMARD, Denis</creatorcontrib><creatorcontrib>ORVEN, Matthieu</creatorcontrib><creatorcontrib>BARRES, Thomas</creatorcontrib><title>MATERIAL COMPRISING A STACK WITH A THIN ZINC-BASED DIELECTRIC OXIDE UNDERLAYER AND METHOD FOR DEPOSITING SAID MATERIAL</title><description>The invention relates to a material comprising a substrate (30) coated on one face (29) with a stack of thin layers (14) comprising at least one metal functional layer (140) and further comprising: - an oxide underlayer based on zinc, ZnO (129), between 0.3 and 4.4 nm; - a mixed oxide dielectric underlayer based on zinc and tin, SniZnjO (128) between 3.0 and 50.0 nm; - a nitride underlayer based on silicon, Si3N4 (127), or silicon-zirconium, SixNyZrz, between 5.0 and 30.0 nm; - a capping layer (150) of titanium oxide, TiOx, located on and in contact with said functional layer (140).</description><subject>CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS</subject><subject>CHEMISTRY</subject><subject>GLASS</subject><subject>JOINING GLASS TO GLASS OR OTHER MATERIALS</subject><subject>METALLURGY</subject><subject>MINERAL OR SLAG WOOL</subject><subject>SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS</subject><subject>SURFACE TREATMENT OF GLASS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjU0KwjAQhbtxIeod5gJdaKv7aTI1g21SkhF_NqVIXIkWKp7fCj2Aq8fje3xvnnxqFPKMFShXN54D2z0gBEF1gBOLGYsYtnBlq9ICA2nQTBUp8azAnVkTHK0mX-GFPKDVUJMYp6F0HjQ1LrD8pAF5RNPbMpndu8cQV1MuEihJlElj_2rj0He3-Izvlpp8s8vy7bZYZ39MvnKKOJ8</recordid><startdate>20241106</startdate><enddate>20241106</enddate><creator>GUIMARD, Denis</creator><creator>ORVEN, Matthieu</creator><creator>BARRES, Thomas</creator><scope>EVB</scope></search><sort><creationdate>20241106</creationdate><title>MATERIAL COMPRISING A STACK WITH A THIN ZINC-BASED DIELECTRIC OXIDE UNDERLAYER AND METHOD FOR DEPOSITING SAID MATERIAL</title><author>GUIMARD, Denis ; ORVEN, Matthieu ; BARRES, Thomas</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP4263455B13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2024</creationdate><topic>CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS</topic><topic>CHEMISTRY</topic><topic>GLASS</topic><topic>JOINING GLASS TO GLASS OR OTHER MATERIALS</topic><topic>METALLURGY</topic><topic>MINERAL OR SLAG WOOL</topic><topic>SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS</topic><topic>SURFACE TREATMENT OF GLASS</topic><toplevel>online_resources</toplevel><creatorcontrib>GUIMARD, Denis</creatorcontrib><creatorcontrib>ORVEN, Matthieu</creatorcontrib><creatorcontrib>BARRES, Thomas</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>GUIMARD, Denis</au><au>ORVEN, Matthieu</au><au>BARRES, Thomas</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>MATERIAL COMPRISING A STACK WITH A THIN ZINC-BASED DIELECTRIC OXIDE UNDERLAYER AND METHOD FOR DEPOSITING SAID MATERIAL</title><date>2024-11-06</date><risdate>2024</risdate><abstract>The invention relates to a material comprising a substrate (30) coated on one face (29) with a stack of thin layers (14) comprising at least one metal functional layer (140) and further comprising: - an oxide underlayer based on zinc, ZnO (129), between 0.3 and 4.4 nm; - a mixed oxide dielectric underlayer based on zinc and tin, SniZnjO (128) between 3.0 and 50.0 nm; - a nitride underlayer based on silicon, Si3N4 (127), or silicon-zirconium, SixNyZrz, between 5.0 and 30.0 nm; - a capping layer (150) of titanium oxide, TiOx, located on and in contact with said functional layer (140).</abstract><oa>free_for_read</oa></addata></record> |
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subjects | CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMISTRY GLASS JOINING GLASS TO GLASS OR OTHER MATERIALS METALLURGY MINERAL OR SLAG WOOL SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS |
title | MATERIAL COMPRISING A STACK WITH A THIN ZINC-BASED DIELECTRIC OXIDE UNDERLAYER AND METHOD FOR DEPOSITING SAID MATERIAL |
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