MATERIAL COMPRISING A STACK WITH A THIN ZINC-BASED DIELECTRIC OXIDE UNDERLAYER AND METHOD FOR DEPOSITING SAID MATERIAL

The invention relates to a material comprising a substrate (30) coated on one face (29) with a stack of thin layers (14) comprising at least one metal functional layer (140) and further comprising: - an oxide underlayer based on zinc, ZnO (129), between 0.3 and 4.4 nm; - a mixed oxide dielectric und...

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Hauptverfasser: GUIMARD, Denis, ORVEN, Matthieu, BARRES, Thomas
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creator GUIMARD, Denis
ORVEN, Matthieu
BARRES, Thomas
description The invention relates to a material comprising a substrate (30) coated on one face (29) with a stack of thin layers (14) comprising at least one metal functional layer (140) and further comprising: - an oxide underlayer based on zinc, ZnO (129), between 0.3 and 4.4 nm; - a mixed oxide dielectric underlayer based on zinc and tin, SniZnjO (128) between 3.0 and 50.0 nm; - a nitride underlayer based on silicon, Si3N4 (127), or silicon-zirconium, SixNyZrz, between 5.0 and 30.0 nm; - a capping layer (150) of titanium oxide, TiOx, located on and in contact with said functional layer (140).
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP4263455B1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP4263455B1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP4263455B13</originalsourceid><addsrcrecordid>eNqNjU0KwjAQhbtxIeod5gJdaKv7aTI1g21SkhF_NqVIXIkWKp7fCj2Aq8fje3xvnnxqFPKMFShXN54D2z0gBEF1gBOLGYsYtnBlq9ICA2nQTBUp8azAnVkTHK0mX-GFPKDVUJMYp6F0HjQ1LrD8pAF5RNPbMpndu8cQV1MuEihJlElj_2rj0He3-Izvlpp8s8vy7bZYZ39MvnKKOJ8</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>MATERIAL COMPRISING A STACK WITH A THIN ZINC-BASED DIELECTRIC OXIDE UNDERLAYER AND METHOD FOR DEPOSITING SAID MATERIAL</title><source>esp@cenet</source><creator>GUIMARD, Denis ; ORVEN, Matthieu ; BARRES, Thomas</creator><creatorcontrib>GUIMARD, Denis ; ORVEN, Matthieu ; BARRES, Thomas</creatorcontrib><description>The invention relates to a material comprising a substrate (30) coated on one face (29) with a stack of thin layers (14) comprising at least one metal functional layer (140) and further comprising: - an oxide underlayer based on zinc, ZnO (129), between 0.3 and 4.4 nm; - a mixed oxide dielectric underlayer based on zinc and tin, SniZnjO (128) between 3.0 and 50.0 nm; - a nitride underlayer based on silicon, Si3N4 (127), or silicon-zirconium, SixNyZrz, between 5.0 and 30.0 nm; - a capping layer (150) of titanium oxide, TiOx, located on and in contact with said functional layer (140).</description><language>eng ; fre ; ger</language><subject>CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS ; CHEMISTRY ; GLASS ; JOINING GLASS TO GLASS OR OTHER MATERIALS ; METALLURGY ; MINERAL OR SLAG WOOL ; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS ; SURFACE TREATMENT OF GLASS</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20241106&amp;DB=EPODOC&amp;CC=EP&amp;NR=4263455B1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20241106&amp;DB=EPODOC&amp;CC=EP&amp;NR=4263455B1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>GUIMARD, Denis</creatorcontrib><creatorcontrib>ORVEN, Matthieu</creatorcontrib><creatorcontrib>BARRES, Thomas</creatorcontrib><title>MATERIAL COMPRISING A STACK WITH A THIN ZINC-BASED DIELECTRIC OXIDE UNDERLAYER AND METHOD FOR DEPOSITING SAID MATERIAL</title><description>The invention relates to a material comprising a substrate (30) coated on one face (29) with a stack of thin layers (14) comprising at least one metal functional layer (140) and further comprising: - an oxide underlayer based on zinc, ZnO (129), between 0.3 and 4.4 nm; - a mixed oxide dielectric underlayer based on zinc and tin, SniZnjO (128) between 3.0 and 50.0 nm; - a nitride underlayer based on silicon, Si3N4 (127), or silicon-zirconium, SixNyZrz, between 5.0 and 30.0 nm; - a capping layer (150) of titanium oxide, TiOx, located on and in contact with said functional layer (140).</description><subject>CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS</subject><subject>CHEMISTRY</subject><subject>GLASS</subject><subject>JOINING GLASS TO GLASS OR OTHER MATERIALS</subject><subject>METALLURGY</subject><subject>MINERAL OR SLAG WOOL</subject><subject>SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS</subject><subject>SURFACE TREATMENT OF GLASS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjU0KwjAQhbtxIeod5gJdaKv7aTI1g21SkhF_NqVIXIkWKp7fCj2Aq8fje3xvnnxqFPKMFShXN54D2z0gBEF1gBOLGYsYtnBlq9ICA2nQTBUp8azAnVkTHK0mX-GFPKDVUJMYp6F0HjQ1LrD8pAF5RNPbMpndu8cQV1MuEihJlElj_2rj0He3-Izvlpp8s8vy7bZYZ39MvnKKOJ8</recordid><startdate>20241106</startdate><enddate>20241106</enddate><creator>GUIMARD, Denis</creator><creator>ORVEN, Matthieu</creator><creator>BARRES, Thomas</creator><scope>EVB</scope></search><sort><creationdate>20241106</creationdate><title>MATERIAL COMPRISING A STACK WITH A THIN ZINC-BASED DIELECTRIC OXIDE UNDERLAYER AND METHOD FOR DEPOSITING SAID MATERIAL</title><author>GUIMARD, Denis ; ORVEN, Matthieu ; BARRES, Thomas</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP4263455B13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2024</creationdate><topic>CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS</topic><topic>CHEMISTRY</topic><topic>GLASS</topic><topic>JOINING GLASS TO GLASS OR OTHER MATERIALS</topic><topic>METALLURGY</topic><topic>MINERAL OR SLAG WOOL</topic><topic>SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS</topic><topic>SURFACE TREATMENT OF GLASS</topic><toplevel>online_resources</toplevel><creatorcontrib>GUIMARD, Denis</creatorcontrib><creatorcontrib>ORVEN, Matthieu</creatorcontrib><creatorcontrib>BARRES, Thomas</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>GUIMARD, Denis</au><au>ORVEN, Matthieu</au><au>BARRES, Thomas</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>MATERIAL COMPRISING A STACK WITH A THIN ZINC-BASED DIELECTRIC OXIDE UNDERLAYER AND METHOD FOR DEPOSITING SAID MATERIAL</title><date>2024-11-06</date><risdate>2024</risdate><abstract>The invention relates to a material comprising a substrate (30) coated on one face (29) with a stack of thin layers (14) comprising at least one metal functional layer (140) and further comprising: - an oxide underlayer based on zinc, ZnO (129), between 0.3 and 4.4 nm; - a mixed oxide dielectric underlayer based on zinc and tin, SniZnjO (128) between 3.0 and 50.0 nm; - a nitride underlayer based on silicon, Si3N4 (127), or silicon-zirconium, SixNyZrz, between 5.0 and 30.0 nm; - a capping layer (150) of titanium oxide, TiOx, located on and in contact with said functional layer (140).</abstract><oa>free_for_read</oa></addata></record>
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language eng ; fre ; ger
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subjects CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS
CHEMISTRY
GLASS
JOINING GLASS TO GLASS OR OTHER MATERIALS
METALLURGY
MINERAL OR SLAG WOOL
SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS
SURFACE TREATMENT OF GLASS
title MATERIAL COMPRISING A STACK WITH A THIN ZINC-BASED DIELECTRIC OXIDE UNDERLAYER AND METHOD FOR DEPOSITING SAID MATERIAL
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