SKIN CLEANSING COMPOSITION
Disclosed is a skin cleansing composition comprising anionic surfactant selected from alkyl sulfates, alkyl ether sulfates, or a mixture thereof; polypropylene glycol; and diol; wherein the weight ratio of the diol to the anionic surfactant is at least 1:5.
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creator | SUN, Yingqing CAO, Yixuan ZHU, Sunxin SHENG, Saihong |
description | Disclosed is a skin cleansing composition comprising anionic surfactant selected from alkyl sulfates, alkyl ether sulfates, or a mixture thereof; polypropylene glycol; and diol; wherein the weight ratio of the diol to the anionic surfactant is at least 1:5. |
format | Patent |
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language | eng ; fre ; ger |
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subjects | ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES CANDLES CHEMISTRY DETERGENT COMPOSITIONS DETERGENTS FATTY ACIDS THEREFROM HUMAN NECESSITIES HYGIENE MEDICAL OR VETERINARY SCIENCE METALLURGY PREPARATIONS FOR MEDICAL, DENTAL, OR TOILET PURPOSES RECOVERY OF GLYCEROL RESIN SOAPS SOAP OR SOAP-MAKING SPECIFIC USE OF COSMETICS OR SIMILAR TOILETPREPARATIONS USE OF SINGLE SUBSTANCES AS DETERGENTS |
title | SKIN CLEANSING COMPOSITION |
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