APPARATUS AND METHODS FOR CONTROLLING ION ENERGY DISTRIBUTION

Embodiments of the present disclosure generally relate to apparatus and methods for controlling an ion energy distribution during plasma processing. In an embodiment, the apparatus includes a substrate support that has a body having a substrate electrode for applying a substrate voltage to a substra...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: ROGERS, James, CUI, Linying
Format: Patent
Sprache:eng ; fre ; ger
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