TRIESTER-BASED PLASTICIZER COMPOSITION, AND RESIN COMPOSITION COMPRISING SAME

TRIESTER-BASED PLASTICIZER COMPOSITION, AND RESIN COMPOSITION COMPRISING SAME

The present invention relates to a triester-based plasticizer composition characterized in comprising a product derived from the esterification of a carboxylic acid composition comprising a hexanoic acid isomer mixture and benzoic acid, and a trihydric alcohol. If the plasticizer composition is appl...

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Hauptverfasser: WOO, Seung Taek, KIM, Eun Suk, KIM, Hyun Kyu, MOON, Jeong Ju, KIM, Joo Ho
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
CHEMISTRY
COMPOSITIONS BASED THEREON
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
THEIR PREPARATION OR CHEMICAL WORKING-UP
USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS
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creator WOO, Seung Taek
KIM, Eun Suk
KIM, Hyun Kyu
MOON, Jeong Ju
KIM, Joo Ho
description The present invention relates to a triester-based plasticizer composition characterized in comprising a product derived from the esterification of a carboxylic acid composition comprising a hexanoic acid isomer mixture and benzoic acid, and a trihydric alcohol. If the plasticizer composition is applied to a resin, migration resistance and volatile loss may be maintained to equal levels, and mechanical properties, absorption rate, stress migration and plasticization efficiency may be markedly improved in contrast to a case applying the conventional plasticizer.
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subjects CHEMISTRY
COMPOSITIONS BASED THEREON
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
THEIR PREPARATION OR CHEMICAL WORKING-UP
USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS
title TRIESTER-BASED PLASTICIZER COMPOSITION, AND RESIN COMPOSITION COMPRISING SAME
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