MEANS AND METHOD OF MENISCUS CONFINED ELECTROCHEMICAL DEPOSITION WITH ACCURATE MEANS OF THICKNESS ASSESSMENT

The present invention discloses a system for 3D printing by using meniscus-confined electrodeposition, using at least one pipette, carrying at least one electrolyte, at least one means of thickness or deposition rate assessment and at least one motion control mechanism, configured to allow the depos...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: MANSDORF, Nadav, OREN, Eran
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator MANSDORF, Nadav
OREN, Eran
description The present invention discloses a system for 3D printing by using meniscus-confined electrodeposition, using at least one pipette, carrying at least one electrolyte, at least one means of thickness or deposition rate assessment and at least one motion control mechanism, configured to allow the deposition of at least one deposited metal on a substrate. The invention also discloses a method of 3D printing, characterized by one or more steps of meniscus-confined electrodepositing, using at least one pipette, carrying at least one electrolyte, utilizing at least one means of thickness or deposition rate assessment and at least one motion control mechanism, thereby enabling the deposing of at least one deposited metal on a substrate.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP4208588A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP4208588A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP4208588A13</originalsourceid><addsrcrecordid>eNqNzD0KwkAQhuE0FqLeYS4g-Atpl9kJO5jMBmeCZQiyVkED8f64oAewer_i41kWY0NOFJx4aMhC9BCrvIQVOwWMUrGQB6oJ7RoxUMPoavDURmXjKHBjC-AQu6szgi-XDQuMFyHNtmpONm1dLB7DOKfNr6sCKjIM2zS9-jRPwz0907un9nTYleeydPvjH5cPhEc2bA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>MEANS AND METHOD OF MENISCUS CONFINED ELECTROCHEMICAL DEPOSITION WITH ACCURATE MEANS OF THICKNESS ASSESSMENT</title><source>esp@cenet</source><creator>MANSDORF, Nadav ; OREN, Eran</creator><creatorcontrib>MANSDORF, Nadav ; OREN, Eran</creatorcontrib><description>The present invention discloses a system for 3D printing by using meniscus-confined electrodeposition, using at least one pipette, carrying at least one electrolyte, at least one means of thickness or deposition rate assessment and at least one motion control mechanism, configured to allow the deposition of at least one deposited metal on a substrate. The invention also discloses a method of 3D printing, characterized by one or more steps of meniscus-confined electrodepositing, using at least one pipette, carrying at least one electrolyte, utilizing at least one means of thickness or deposition rate assessment and at least one motion control mechanism, thereby enabling the deposing of at least one deposited metal on a substrate.</description><language>eng ; fre ; ger</language><subject>AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING ; APPARATUS THEREFOR ; CHEMISTRY ; ELECTROFORMING ; ELECTROLYTIC OR ELECTROPHORETIC PROCESSES ; METALLURGY ; PERFORMING OPERATIONS ; PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS ; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR ; SHAPING OR JOINING OF PLASTICS ; TRANSPORTING ; WORKING OF PLASTICS ; WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20230712&amp;DB=EPODOC&amp;CC=EP&amp;NR=4208588A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20230712&amp;DB=EPODOC&amp;CC=EP&amp;NR=4208588A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MANSDORF, Nadav</creatorcontrib><creatorcontrib>OREN, Eran</creatorcontrib><title>MEANS AND METHOD OF MENISCUS CONFINED ELECTROCHEMICAL DEPOSITION WITH ACCURATE MEANS OF THICKNESS ASSESSMENT</title><description>The present invention discloses a system for 3D printing by using meniscus-confined electrodeposition, using at least one pipette, carrying at least one electrolyte, at least one means of thickness or deposition rate assessment and at least one motion control mechanism, configured to allow the deposition of at least one deposited metal on a substrate. The invention also discloses a method of 3D printing, characterized by one or more steps of meniscus-confined electrodepositing, using at least one pipette, carrying at least one electrolyte, utilizing at least one means of thickness or deposition rate assessment and at least one motion control mechanism, thereby enabling the deposing of at least one deposited metal on a substrate.</description><subject>AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING</subject><subject>APPARATUS THEREFOR</subject><subject>CHEMISTRY</subject><subject>ELECTROFORMING</subject><subject>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</subject><subject>METALLURGY</subject><subject>PERFORMING OPERATIONS</subject><subject>PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</subject><subject>SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR</subject><subject>SHAPING OR JOINING OF PLASTICS</subject><subject>TRANSPORTING</subject><subject>WORKING OF PLASTICS</subject><subject>WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNzD0KwkAQhuE0FqLeYS4g-Atpl9kJO5jMBmeCZQiyVkED8f64oAewer_i41kWY0NOFJx4aMhC9BCrvIQVOwWMUrGQB6oJ7RoxUMPoavDURmXjKHBjC-AQu6szgi-XDQuMFyHNtmpONm1dLB7DOKfNr6sCKjIM2zS9-jRPwz0907un9nTYleeydPvjH5cPhEc2bA</recordid><startdate>20230712</startdate><enddate>20230712</enddate><creator>MANSDORF, Nadav</creator><creator>OREN, Eran</creator><scope>EVB</scope></search><sort><creationdate>20230712</creationdate><title>MEANS AND METHOD OF MENISCUS CONFINED ELECTROCHEMICAL DEPOSITION WITH ACCURATE MEANS OF THICKNESS ASSESSMENT</title><author>MANSDORF, Nadav ; OREN, Eran</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP4208588A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2023</creationdate><topic>AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING</topic><topic>APPARATUS THEREFOR</topic><topic>CHEMISTRY</topic><topic>ELECTROFORMING</topic><topic>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</topic><topic>METALLURGY</topic><topic>PERFORMING OPERATIONS</topic><topic>PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</topic><topic>SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR</topic><topic>SHAPING OR JOINING OF PLASTICS</topic><topic>TRANSPORTING</topic><topic>WORKING OF PLASTICS</topic><topic>WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL</topic><toplevel>online_resources</toplevel><creatorcontrib>MANSDORF, Nadav</creatorcontrib><creatorcontrib>OREN, Eran</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MANSDORF, Nadav</au><au>OREN, Eran</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>MEANS AND METHOD OF MENISCUS CONFINED ELECTROCHEMICAL DEPOSITION WITH ACCURATE MEANS OF THICKNESS ASSESSMENT</title><date>2023-07-12</date><risdate>2023</risdate><abstract>The present invention discloses a system for 3D printing by using meniscus-confined electrodeposition, using at least one pipette, carrying at least one electrolyte, at least one means of thickness or deposition rate assessment and at least one motion control mechanism, configured to allow the deposition of at least one deposited metal on a substrate. The invention also discloses a method of 3D printing, characterized by one or more steps of meniscus-confined electrodepositing, using at least one pipette, carrying at least one electrolyte, utilizing at least one means of thickness or deposition rate assessment and at least one motion control mechanism, thereby enabling the deposing of at least one deposited metal on a substrate.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng ; fre ; ger
recordid cdi_epo_espacenet_EP4208588A1
source esp@cenet
subjects AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
APPARATUS THEREFOR
CHEMISTRY
ELECTROFORMING
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES
METALLURGY
PERFORMING OPERATIONS
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS
SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR
SHAPING OR JOINING OF PLASTICS
TRANSPORTING
WORKING OF PLASTICS
WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
title MEANS AND METHOD OF MENISCUS CONFINED ELECTROCHEMICAL DEPOSITION WITH ACCURATE MEANS OF THICKNESS ASSESSMENT
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-06T23%3A23%3A10IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=MANSDORF,%20Nadav&rft.date=2023-07-12&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EEP4208588A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true