COPOLYMER AND HOT MELT COMPOSITIONS COMPRISING SAID COPOLYMER
The present application is directed to a copolymer obtained by free radical polymerization, said copolymer comprising, based on the total weight of monomers:from 0.01 to 10 wt.% of a) at least one co-polymerizable photoinitiator having an ethylenically unsaturated group and a moiety that is decompos...
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| creator | Roschkowski, Thomas Schneider, Anja Zimmermann, Lena |
| description | The present application is directed to a copolymer obtained by free radical polymerization, said copolymer comprising, based on the total weight of monomers:from 0.01 to 10 wt.% of a) at least one co-polymerizable photoinitiator having an ethylenically unsaturated group and a moiety that is decomposable under photo-irradiation to form a radical;from 0.01 to 10 wt.% of b) at least one epoxy (meth)acrylate monomer having at least one (meth)acrylate group and at least one epoxide group; and,from 80 to 99.98 wt.% of c) at least one ethylenically unsaturated monomer which does not bear an epoxide group or a moiety decomposable under photo-irradiation to form a radical.The present application is further directed to a material which is crosslinkable under photoirradiation, said material comprising: a copolymer as defined above; and, at least one ionic photoacid generator (PAG). |
| format | Patent |
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and,from 80 to 99.98 wt.% of c) at least one ethylenically unsaturated monomer which does not bear an epoxide group or a moiety decomposable under photo-irradiation to form a radical.The present application is further directed to a material which is crosslinkable under photoirradiation, said material comprising: a copolymer as defined above; and, at least one ionic photoacid generator (PAG).</description><language>eng ; fre ; ger</language><subject>ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE ; ADHESIVES ; CHEMISTRY ; COMPOSITIONS BASED THEREON ; DYES ; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL ; ORGANIC MACROMOLECULAR COMPOUNDS ; PAINTS ; POLISHES ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; USE OF MATERIALS AS ADHESIVES</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230524&DB=EPODOC&CC=EP&NR=4183807A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230524&DB=EPODOC&CC=EP&NR=4183807A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Roschkowski, Thomas</creatorcontrib><creatorcontrib>Schneider, Anja</creatorcontrib><creatorcontrib>Zimmermann, Lena</creatorcontrib><title>COPOLYMER AND HOT MELT COMPOSITIONS COMPRISING SAID COPOLYMER</title><description>The present application is directed to a copolymer obtained by free radical polymerization, said copolymer comprising, based on the total weight of monomers:from 0.01 to 10 wt.% of a) at least one co-polymerizable photoinitiator having an ethylenically unsaturated group and a moiety that is decomposable under photo-irradiation to form a radical;from 0.01 to 10 wt.% of b) at least one epoxy (meth)acrylate monomer having at least one (meth)acrylate group and at least one epoxide group; 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and,from 80 to 99.98 wt.% of c) at least one ethylenically unsaturated monomer which does not bear an epoxide group or a moiety decomposable under photo-irradiation to form a radical.The present application is further directed to a material which is crosslinkable under photoirradiation, said material comprising: a copolymer as defined above; and, at least one ionic photoacid generator (PAG).</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE ADHESIVES CHEMISTRY COMPOSITIONS BASED THEREON DYES MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL ORGANIC MACROMOLECULAR COMPOUNDS PAINTS POLISHES THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF MATERIALS AS ADHESIVES |
| title | COPOLYMER AND HOT MELT COMPOSITIONS COMPRISING SAID COPOLYMER |
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