ANTI-REFLECTION SUBSTRATE
According to the present invention, there can be provided an antireflection substrate formed by laminating the following layers (A), (B), (C) and (D) in this order:a substrate layer (A),a hard coating layer (B),a light absorbing layer (C), anda low refractive index layer (D), formed by curing a low...
Gespeichert in:
| Hauptverfasser: | , |
|---|---|
| Format: | Patent |
| Sprache: | eng ; fre ; ger |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| Zusammenfassung: | According to the present invention, there can be provided an antireflection substrate formed by laminating the following layers (A), (B), (C) and (D) in this order:a substrate layer (A),a hard coating layer (B),a light absorbing layer (C), anda low refractive index layer (D), formed by curing a low refractive index resin composition containing an active energy ray-curable resin, hollow silica and a fluorine compound by an active energy ray, whereinthe film thickness of the light absorbing layer (C) is 1 to 20 nm. |
|---|