PELLICLE FRAME, PELLICLE, EXPOSURE ORIGINAL PLATE WITH PELLICLE, EXPOSURE METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR, AND METHOD FOR MANUFACTURING LIQUID CRYSTAL DISPLAY BOARD

PELLICLE FRAME, PELLICLE, EXPOSURE ORIGINAL PLATE WITH PELLICLE, EXPOSURE METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR, AND METHOD FOR MANUFACTURING LIQUID CRYSTAL DISPLAY BOARD

Provided are a pellicle frame (1), a pellicle, an exposure original plate with a pellicle, an exposure method, a method for manufacturing a semiconductor, and a method for manufacturing a liquid crystal display board, the frame-shaped pellicle frame (1) having an upper end surface (13) on which a pe...

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1. Verfasser: YANASE, Yu
Format: Patent
Sprache:eng ; fre ; ger
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APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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creator YANASE, Yu
description Provided are a pellicle frame (1), a pellicle, an exposure original plate with a pellicle, an exposure method, a method for manufacturing a semiconductor, and a method for manufacturing a liquid crystal display board, the frame-shaped pellicle frame (1) having an upper end surface (13) on which a pellicle film is provided, and a lower end surface (14) facing a photomask, wherein the pellicle frame (1) is metallic, a cutout portion (20) with the upper end surface (13) or the lower end surface (14) opened is provided from the outer surface toward the inner surface thereof, and the total ventilation area in the inner surface is 0.001 mm2 or more per 1 mm3 of the volume of an inner space of the pellicle. It becomes thus possible to provide a pellicle frame wherein a pellicle film is not broken by withstanding a pressure change from atmospheric pressure to vacuum when EUV exposure is performed under vacuum, frame workability is good, and a frame is not broken when a pellicle is peeled off.
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It becomes thus possible to provide a pellicle frame wherein a pellicle film is not broken by withstanding a pressure change from atmospheric pressure to vacuum when EUV exposure is performed under vacuum, frame workability is good, and a frame is not broken when a pellicle is peeled off.</abstract><oa>free_for_read</oa></addata></record>
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language eng ; fre ; ger
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subjects APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
title PELLICLE FRAME, PELLICLE, EXPOSURE ORIGINAL PLATE WITH PELLICLE, EXPOSURE METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR, AND METHOD FOR MANUFACTURING LIQUID CRYSTAL DISPLAY BOARD
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