PROGRAMMABLE ILLUMINATOR OF A LITHOGRAPHIC APPARATUS

The invention relates to a system comprising a micromirror array including:- a substrate,- a plurality of moveable micromirrors for reflecting incident light and supported from the substrate,- an actuator system configured to position each of the plurality of micromirrors based on one or more actuat...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	PASVEER, Willem, Franke, STEEGHS, Marco, Matheus, Louis, HARTGERS, Albertus
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The invention relates to a system comprising a micromirror array including:- a substrate,- a plurality of moveable micromirrors for reflecting incident light and supported from the substrate,- an actuator system configured to position each of the plurality of micromirrors based on one or more actuator control signals,- a measurement system configured to measure a position of each of the plurality of micromirrors, and- a control unit configured to generate the one or more actuator control signals based on an output of the measurement system.At least some of the micromirrors of the array comprise a temperature sensor configured to measure a temperature of the respective micromirror. The system further includes a processor, wherein the processor is configured to receive the measured temperatures of the at least some micromirrors and to determine an incident light related energy parameter.