DEVICE AND METHOD FOR MEASURING SHORT-WAVELENGTH CHARACTERISTIC X-RAY DIFFRACTION BASED ON ARRAY DETECTION

A device for measuring short-wavelength characteristic X-ray diffraction based on array detection, and a measurement and analysis method based on the device are provided. An array detector of the device only detects and receives a diffraction ray which is diffracted by a material of a to-be-measured...

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Hauptverfasser: CHEN, Xin, ZHOU, Kun, FENG, Xianhe, WANG, Chengzhang, ZHANG, Lunwu, WU, Taibin, CHE, Luchang, DOU, Shitao, ZHENG, Lin, ZHANG, Jin, HE, Changguang, ZHAO, Fangchao
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:A device for measuring short-wavelength characteristic X-ray diffraction based on array detection, and a measurement and analysis method based on the device are provided. An array detector of the device only detects and receives a diffraction ray which is diffracted by a material of a to-be-measured part inside a sample and passes through a through hole of a receiving collimator, and rays passing through a positioning hole. The to-be-measured part inside the sample is placed at the center of the diffractometer circle of the device. The method is performed with the device. With the present disclosure, a diffraction pattern of a part inside the sample with a centimeter thickness, i.e. Debye rings, can be rapidly and non-destructively measured, thereby rapidly and non-destructively measuring and analyzing crystal structures, and its crystal structural change of the part inside the sample, such as phase, texture, and stress.