METHOD OF DETERMINING AT LEAST A TARGET LAYOUT AND ASSOCIATED METROLOGY APPARATUS

Disclosed is a method of optimizing a target layout for a patterning device and a sampling scheme for measuring the targets of said target layout exposed on a substrate, the method comprising co-optimizing said target layout and said sampling scheme to obtain an optimized target layout for the patte...

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Bibliographische Detailangaben
Hauptverfasser:	WERKMAN, Roy, RIJPSTRA, Manouk, WILDENBERG, Jochem, Sebastiaan
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	Disclosed is a method of optimizing a target layout for a patterning device and a sampling scheme for measuring the targets of said target layout exposed on a substrate, the method comprising co-optimizing said target layout and said sampling scheme to obtain an optimized target layout for the patterning device and an optimized sampling scheme for measuring the targets of the optimized target layout exposed on a substrate..