HIGH TEMPERATURE RESISTANT REFLECTIVE LAYER FOR WAVELENGTH CONVERSION DEVICES
A wavelength conversion device (100) comprises: a substrate (110), a reflective layer (120) on the substrate (110) and a wavelength conversion layer (130) on the reflective layer (120). The reflective layer (120) comprises a binder (121) and reflective titanium dioxide nanoparticles (122). The nanop...
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| creator | LIANG, Ansheng ZHANG, Wenbo |
| description | A wavelength conversion device (100) comprises: a substrate (110), a reflective layer (120) on the substrate (110) and a wavelength conversion layer (130) on the reflective layer (120). The reflective layer (120) comprises a binder (121) and reflective titanium dioxide nanoparticles (122). The nanoparticles (122) have a particle size of about 200 nanometers to about 500 nanometers. The reflective layer (120) has enhanced thermal stability. Methods of manufacture the wavelength conversion device are also disclosed. |
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The reflective layer (120) comprises a binder (121) and reflective titanium dioxide nanoparticles (122). The nanoparticles (122) have a particle size of about 200 nanometers to about 500 nanometers. The reflective layer (120) has enhanced thermal stability. 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The reflective layer (120) comprises a binder (121) and reflective titanium dioxide nanoparticles (122). The nanoparticles (122) have a particle size of about 200 nanometers to about 500 nanometers. The reflective layer (120) has enhanced thermal stability. Methods of manufacture the wavelength conversion device are also disclosed.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng ; fre ; ger |
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| subjects | ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHOTOGRAPHY PHYSICS |
| title | HIGH TEMPERATURE RESISTANT REFLECTIVE LAYER FOR WAVELENGTH CONVERSION DEVICES |
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