PATTERNING OF MULTI-DEPTH OPTICAL DEVICES

Methods for patterning of multi-depth layers for the fabrication of optical devices are provided. In one embodiment, a method is provided that includes disposing a resist layer over a device layer disposed over a top surface of a substrate, the device layer having a first portion and a second portio...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	MCMACKIN, Ian Matthew, MCMILLAN, Wayne, CHEN, Chien-An, GODET, Ludovic, COHEN, Brian Alexander
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHYSICS
Online-Zugang:	Volltext bestellen
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