METHOD FOR CONTROLLING A LITHOGRAPHIC SYSTEM

A lithographic system comprises a radiation source and a lithographic apparatus. The radiation source provides radiation to the lithographic apparatus. The lithographic apparatus uses the radiation for imaging a pattern onto multiple target areas on a layer of photo-resist on a semiconductor substra...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KEMPEN, Antonius, Theodorus, Wilhelmus, VAN DEN BRINK, Marinus, Aart, NOORDMAN, Oscar, Franciscus, Jozephus, VAN SCHOOT, Jan, Bernard, Plechelmus
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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