CERIA REMOVAL COMPOSITIONS

The present invention generally relates to a removal composition and process, particularly useful for cleaning ceria particles and CMP contaminants from microelectronic devices having said particles and CMP contaminants thereon, in particular microelectronic devices having PETEOS, Silicon Nitride, a...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: WHITE, Daniela, WHITE, Michael, DAS, Atanu K
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
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