METHOD AND APPARATUS FOR FORMING A PATTERNED LAYER OF MATERIAL

Methods and apparatus for forming a patterned layer of material are disclosed. In one arrangement, a deposition-process material is provided in gaseous form. A layer of the deposition-process material is formed on the substrate by causing condensation or deposition of the gaseous deposition-process...

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Bibliographische Detailangaben
Hauptverfasser: DRUZHININA, Tamara, DE VRIES, Gosse, Charles, POLYAKOV, Alexey, Olegovich, OVERKAMP, Jim, Vincent, KURGANOVA, Evgenia, COENEN, Teis, Johan, CASTELLANOS ORTEGA, Sonia, LUGIER, Olivier, Christian, Maurice
Format: Patent
Sprache:eng ; fre ; ger
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