DEVICE FOR CHEMICAL VAPOUR DEPOSITION ASSISTED BY PLASMA WITH ENHANCED PRODUCTION CAPACITY
Dispositif de dépôt chimique en phase vapeur assisté par plasma sur une pluralité de substrats comportant une enceinte, des moyens d'alimentation en gaz et des moyens d'évacuation connectés à l'enceinte, un porte-nacelle (6) logé dans l'enceinte et configuré pour entrer et être e...
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| creator | MONNA, Rémi VACHEZ, Alexandre |
| description | Dispositif de dépôt chimique en phase vapeur assisté par plasma sur une pluralité de substrats comportant une enceinte, des moyens d'alimentation en gaz et des moyens d'évacuation connectés à l'enceinte, un porte-nacelle (6) logé dans l'enceinte et configuré pour entrer et être extrait par l'ouverture, des nacelles (4) configurées pour supporter des substrats, lesdites nacelles comportant une pluralité de plaques entre lesquelles sont logés les substrats, chaque nacelle (4) comportant des moyens de manutention configurés pour coopérer avec un dispositif de manutention extérieur. Le porte-nacelle (6) et les nacelles (4) sont configurés pour que les nacelles soient suspendues de manière amovible par rapport au porte-nacelle, que les substrats soient orientées verticalement une fois les nacelles suspendues au porte-substrat et que les nacelles soient disposées l'une au-dessus de l'autre.
A device for plasma enhanced chemical vapor deposition on a plurality of substrates, comprising: a chamber; a gas supply member and an exhaust member connected to the chamber; a boat-holder (6) housed in the chamber and configured to enter and exit from the chamber through the opening; a boat-shaped part (4) configured to support the substrate, the boat-shaped part comprising a plurality of plates, the substrate being located between the plates, each boat-shaped part comprising a manipulation member configured to cooperate with an external manipulation device. The boat-holder (6) and the boat-shaped part (4) are configured such that the boat-shaped part is removably suspended on the boat-holder, the substrate is oriented vertically once the boat-shaped part is suspended on the substrate-holder, and the boat-shaped part is arranged one above the other. |
| format | Patent |
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A device for plasma enhanced chemical vapor deposition on a plurality of substrates, comprising: a chamber; a gas supply member and an exhaust member connected to the chamber; a boat-holder (6) housed in the chamber and configured to enter and exit from the chamber through the opening; a boat-shaped part (4) configured to support the substrate, the boat-shaped part comprising a plurality of plates, the substrate being located between the plates, each boat-shaped part comprising a manipulation member configured to cooperate with an external manipulation device. The boat-holder (6) and the boat-shaped part (4) are configured such that the boat-shaped part is removably suspended on the boat-holder, the substrate is oriented vertically once the boat-shaped part is suspended on the substrate-holder, and the boat-shaped part is arranged one above the other.</description><language>eng ; fre ; ger</language><subject>BASIC ELECTRIC ELEMENTS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SEMICONDUCTOR DEVICES ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2021</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210623&DB=EPODOC&CC=EP&NR=3839091A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210623&DB=EPODOC&CC=EP&NR=3839091A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MONNA, Rémi</creatorcontrib><creatorcontrib>VACHEZ, Alexandre</creatorcontrib><title>DEVICE FOR CHEMICAL VAPOUR DEPOSITION ASSISTED BY PLASMA WITH ENHANCED PRODUCTION CAPACITY</title><description>Dispositif de dépôt chimique en phase vapeur assisté par plasma sur une pluralité de substrats comportant une enceinte, des moyens d'alimentation en gaz et des moyens d'évacuation connectés à l'enceinte, un porte-nacelle (6) logé dans l'enceinte et configuré pour entrer et être extrait par l'ouverture, des nacelles (4) configurées pour supporter des substrats, lesdites nacelles comportant une pluralité de plaques entre lesquelles sont logés les substrats, chaque nacelle (4) comportant des moyens de manutention configurés pour coopérer avec un dispositif de manutention extérieur. Le porte-nacelle (6) et les nacelles (4) sont configurés pour que les nacelles soient suspendues de manière amovible par rapport au porte-nacelle, que les substrats soient orientées verticalement une fois les nacelles suspendues au porte-substrat et que les nacelles soient disposées l'une au-dessus de l'autre.
A device for plasma enhanced chemical vapor deposition on a plurality of substrates, comprising: a chamber; a gas supply member and an exhaust member connected to the chamber; a boat-holder (6) housed in the chamber and configured to enter and exit from the chamber through the opening; a boat-shaped part (4) configured to support the substrate, the boat-shaped part comprising a plurality of plates, the substrate being located between the plates, each boat-shaped part comprising a manipulation member configured to cooperate with an external manipulation device. The boat-holder (6) and the boat-shaped part (4) are configured such that the boat-shaped part is removably suspended on the boat-holder, the substrate is oriented vertically once the boat-shaped part is suspended on the substrate-holder, and the boat-shaped part is arranged one above the other.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2021</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNykEKwjAQQNFuXIh6h7mAYMnGLsfJlAy0SUjSSt2UInElWqj3RxEP4OrD562Li-ZeiKF2AchwK4QN9OhdF0Czd1GSOAsYo8TEGk4D-AZji3CWZICtQUuf74PTHX0toUeSNGyL1W26L3n366aAmhOZfZ6fY17m6Zof-TWyV0dVHaoSS_UHeQPu6jFz</recordid><startdate>20210623</startdate><enddate>20210623</enddate><creator>MONNA, Rémi</creator><creator>VACHEZ, Alexandre</creator><scope>EVB</scope></search><sort><creationdate>20210623</creationdate><title>DEVICE FOR CHEMICAL VAPOUR DEPOSITION ASSISTED BY PLASMA WITH ENHANCED PRODUCTION CAPACITY</title><author>MONNA, Rémi ; VACHEZ, Alexandre</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP3839091A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2021</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>MONNA, Rémi</creatorcontrib><creatorcontrib>VACHEZ, Alexandre</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MONNA, Rémi</au><au>VACHEZ, Alexandre</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>DEVICE FOR CHEMICAL VAPOUR DEPOSITION ASSISTED BY PLASMA WITH ENHANCED PRODUCTION CAPACITY</title><date>2021-06-23</date><risdate>2021</risdate><abstract>Dispositif de dépôt chimique en phase vapeur assisté par plasma sur une pluralité de substrats comportant une enceinte, des moyens d'alimentation en gaz et des moyens d'évacuation connectés à l'enceinte, un porte-nacelle (6) logé dans l'enceinte et configuré pour entrer et être extrait par l'ouverture, des nacelles (4) configurées pour supporter des substrats, lesdites nacelles comportant une pluralité de plaques entre lesquelles sont logés les substrats, chaque nacelle (4) comportant des moyens de manutention configurés pour coopérer avec un dispositif de manutention extérieur. Le porte-nacelle (6) et les nacelles (4) sont configurés pour que les nacelles soient suspendues de manière amovible par rapport au porte-nacelle, que les substrats soient orientées verticalement une fois les nacelles suspendues au porte-substrat et que les nacelles soient disposées l'une au-dessus de l'autre.
A device for plasma enhanced chemical vapor deposition on a plurality of substrates, comprising: a chamber; a gas supply member and an exhaust member connected to the chamber; a boat-holder (6) housed in the chamber and configured to enter and exit from the chamber through the opening; a boat-shaped part (4) configured to support the substrate, the boat-shaped part comprising a plurality of plates, the substrate being located between the plates, each boat-shaped part comprising a manipulation member configured to cooperate with an external manipulation device. The boat-holder (6) and the boat-shaped part (4) are configured such that the boat-shaped part is removably suspended on the boat-holder, the substrate is oriented vertically once the boat-shaped part is suspended on the substrate-holder, and the boat-shaped part is arranged one above the other.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | DEVICE FOR CHEMICAL VAPOUR DEPOSITION ASSISTED BY PLASMA WITH ENHANCED PRODUCTION CAPACITY |
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