CLEANSING COMPOSITION

A sulphate free cleansing composition for hair, scalp or skin comprising, in an aqueous continuous phase: a total amount of anionic surfactant, amphoteric surfactant and zwitterionic surfactant consisting of: (i) from 3 wt % to 13 wt %, by weight of the total composition at 100% activity, of an alpha olefin sulfonate anionic surfactant of general formula (I): R1-CH═CH-CH2-SO3-M+ (I) in which R1 is selected from linear or branched alkyl groups having from 11 to 13 carbon atoms and mixtures thereof; and M is a solubilizing cation; (ii) from 1 to 6%, by weight of an amphoteric or zwitterionic surfactant, selected from an alkyl betaine of general formula (II) R2-N+(CH3)2-CH2-COO-M+ (II) wherein R2=C12 (Lauryl) or Coco derived; an alkyl hydroxy sultaine of general formula (III), R3-N+(CH3)2-CH2-CH(0H)-CH2-S03-M+ (III) wherein R3=C12 (Lauryl) or Coco derived; an alkyl aminopropyl hydroxy sultaine of general formula (IV), R4-C0-NH-(CH2)3-N+(CH3)2-CH2-CH(0H)-CH2-S03-M+ (IV) wherein R4=C12 (Lauryl) or Coco derived; an alkyl amphoacetate of general formula (V), R5-C0-NH-(CH2)2-N(CH2-CH2-0H)(CH2-C00-M+) (V) wherein R5=C12 (Lauryl) or Coco derived; and mixtures thereof; (iii) from 0.05 wt % to 0.5 wt % of a cationic polymer; (iv) an inorganic electrolyte; and (iv) water; in which the weight ratio of (i) to (ii) ranges from 1:1 to 6:1 and the pH of the composition is from 3 to 6.5.