CONTROL BASED ON PROBABILITY DENSITY FUNCTION OF PARAMETER

Described herein is a method for determining adjustment to a patterning process. The method includes obtaining a probability density function of a parameter related to a feature of a substrate subject to the patterning process based on measurements of the parameter, determining, by a hardware comput...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ANUNCIADO, Roy, TEL, Wim, Tjibbo, KEA, Marc, Jurian
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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