ELECTRON SOURCE AND ELECTRON GUN

The present disclosure provides an electron source, including one or more tips, wherein at least one of the tips comprises one or more fixed emission sites, wherein at least one of the tips includes one or more fixed emission sites, wherein the emission sites includes a reaction product of metal ato...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: WANG, Junting, DENG, Youyin, HU, Xianbin, JIN, Xueming, CHEN, Dizhi, HUANG, Zhao, LI, Yijing, LIU, Huarong, WANG, Xuehui, QI, Yuxuan
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator WANG, Junting
DENG, Youyin
HU, Xianbin
JIN, Xueming
CHEN, Dizhi
HUANG, Zhao
LI, Yijing
LIU, Huarong
WANG, Xuehui
QI, Yuxuan
description The present disclosure provides an electron source, including one or more tips, wherein at least one of the tips comprises one or more fixed emission sites, wherein at least one of the tips includes one or more fixed emission sites, wherein the emission sites includes a reaction product of metal atoms on a surface of the tip with gas molecules.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP3736848A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP3736848A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP3736848A13</originalsourceid><addsrcrecordid>eNrjZFBw9XF1Dgny91MI9g8NcnZVcPRzQYi5h_rxMLCmJeYUp_JCaW4GBTfXEGcP3dSC_PjU4oLE5NS81JJ41wBjc2MzCxMLR0NjIpQAAK-UIYM</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>ELECTRON SOURCE AND ELECTRON GUN</title><source>esp@cenet</source><creator>WANG, Junting ; DENG, Youyin ; HU, Xianbin ; JIN, Xueming ; CHEN, Dizhi ; HUANG, Zhao ; LI, Yijing ; LIU, Huarong ; WANG, Xuehui ; QI, Yuxuan</creator><creatorcontrib>WANG, Junting ; DENG, Youyin ; HU, Xianbin ; JIN, Xueming ; CHEN, Dizhi ; HUANG, Zhao ; LI, Yijing ; LIU, Huarong ; WANG, Xuehui ; QI, Yuxuan</creatorcontrib><description>The present disclosure provides an electron source, including one or more tips, wherein at least one of the tips comprises one or more fixed emission sites, wherein at least one of the tips includes one or more fixed emission sites, wherein the emission sites includes a reaction product of metal atoms on a surface of the tip with gas molecules.</description><language>eng ; fre ; ger</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRICITY</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20201111&amp;DB=EPODOC&amp;CC=EP&amp;NR=3736848A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20201111&amp;DB=EPODOC&amp;CC=EP&amp;NR=3736848A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>WANG, Junting</creatorcontrib><creatorcontrib>DENG, Youyin</creatorcontrib><creatorcontrib>HU, Xianbin</creatorcontrib><creatorcontrib>JIN, Xueming</creatorcontrib><creatorcontrib>CHEN, Dizhi</creatorcontrib><creatorcontrib>HUANG, Zhao</creatorcontrib><creatorcontrib>LI, Yijing</creatorcontrib><creatorcontrib>LIU, Huarong</creatorcontrib><creatorcontrib>WANG, Xuehui</creatorcontrib><creatorcontrib>QI, Yuxuan</creatorcontrib><title>ELECTRON SOURCE AND ELECTRON GUN</title><description>The present disclosure provides an electron source, including one or more tips, wherein at least one of the tips comprises one or more fixed emission sites, wherein at least one of the tips includes one or more fixed emission sites, wherein the emission sites includes a reaction product of metal atoms on a surface of the tip with gas molecules.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRICITY</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFBw9XF1Dgny91MI9g8NcnZVcPRzQYi5h_rxMLCmJeYUp_JCaW4GBTfXEGcP3dSC_PjU4oLE5NS81JJ41wBjc2MzCxMLR0NjIpQAAK-UIYM</recordid><startdate>20201111</startdate><enddate>20201111</enddate><creator>WANG, Junting</creator><creator>DENG, Youyin</creator><creator>HU, Xianbin</creator><creator>JIN, Xueming</creator><creator>CHEN, Dizhi</creator><creator>HUANG, Zhao</creator><creator>LI, Yijing</creator><creator>LIU, Huarong</creator><creator>WANG, Xuehui</creator><creator>QI, Yuxuan</creator><scope>EVB</scope></search><sort><creationdate>20201111</creationdate><title>ELECTRON SOURCE AND ELECTRON GUN</title><author>WANG, Junting ; DENG, Youyin ; HU, Xianbin ; JIN, Xueming ; CHEN, Dizhi ; HUANG, Zhao ; LI, Yijing ; LIU, Huarong ; WANG, Xuehui ; QI, Yuxuan</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP3736848A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2020</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRICITY</topic><toplevel>online_resources</toplevel><creatorcontrib>WANG, Junting</creatorcontrib><creatorcontrib>DENG, Youyin</creatorcontrib><creatorcontrib>HU, Xianbin</creatorcontrib><creatorcontrib>JIN, Xueming</creatorcontrib><creatorcontrib>CHEN, Dizhi</creatorcontrib><creatorcontrib>HUANG, Zhao</creatorcontrib><creatorcontrib>LI, Yijing</creatorcontrib><creatorcontrib>LIU, Huarong</creatorcontrib><creatorcontrib>WANG, Xuehui</creatorcontrib><creatorcontrib>QI, Yuxuan</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>WANG, Junting</au><au>DENG, Youyin</au><au>HU, Xianbin</au><au>JIN, Xueming</au><au>CHEN, Dizhi</au><au>HUANG, Zhao</au><au>LI, Yijing</au><au>LIU, Huarong</au><au>WANG, Xuehui</au><au>QI, Yuxuan</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>ELECTRON SOURCE AND ELECTRON GUN</title><date>2020-11-11</date><risdate>2020</risdate><abstract>The present disclosure provides an electron source, including one or more tips, wherein at least one of the tips comprises one or more fixed emission sites, wherein at least one of the tips includes one or more fixed emission sites, wherein the emission sites includes a reaction product of metal atoms on a surface of the tip with gas molecules.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng ; fre ; ger
recordid cdi_epo_espacenet_EP3736848A1
source esp@cenet
subjects BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
title ELECTRON SOURCE AND ELECTRON GUN
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-04T01%3A17%3A34IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=WANG,%20Junting&rft.date=2020-11-11&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EEP3736848A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true