METHOD OF DETERMING A VALUE OF A PARAMETER OF INTEREST OF A PATTERNING PROCESS, DEVICE MANUFACTURING METHOD

The disclosure relates to determining a value of a parameter of interest of a patterning process. A plurality of calibration data units is obtained from targets in a metrology process. Each of at least two of the calibration data units represents detected radiation obtained using different respectiv...

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Bibliographische Detailangaben

Hauptverfasser:	SMILDE, Hendrik, Jan, Hidde, BOS, Hilko, Dirk, WARNAAR, Patrick, HAJIAHMADI, Mohammadreza
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MATERIALS THEREFOR MEASURING ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TESTING
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