MULTIPLE ANGLES OF INCIDENCE SEMICONDUCTOR METROLOGY SYSTEMS AND METHODS
An apparatus includes (i) a bright light source for providing an illumination beam at multiple wavelengths selectable with a range from a deep ultraviolet wavelength to an infrared wavelength, (ii) illumination optics for directing the illumination beam towards a sample at selectable sets of angles...
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creator | KRISHNAN, Shankar FILIP, Catalin BRADY, Gregory WANG, David Y FLOCK, Klaus ARAIN, Muzammil DE VEER, Johannes D SHCHEGROV, Andrei ROTTER, Lawrence D |
description | An apparatus includes (i) a bright light source for providing an illumination beam at multiple wavelengths selectable with a range from a deep ultraviolet wavelength to an infrared wavelength, (ii) illumination optics for directing the illumination beam towards a sample at selectable sets of angles of incidence (AOI's) or azimuth angles (AZ's) and polarization states to provide spectroscopic ellipsometry, wherein the illumination optics include an apodizer for controlling a spot size of the illumination beam on the sample at each of the selectable AOI/AZ sets, (iii) collection optics for directing an output beam from the sample in response to the illumination beam at each of the selectable AOI/AZ sets and polarization states towards a detector that generates an output signal or image based on the output beam, and (v) a controller for characterizing a feature of the sample based on the output signal or image. |
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fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP3624174A3</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP3624174A3</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP3624174A33</originalsourceid><addsrcrecordid>eNrjZPDwDfUJ8QzwcVVw9HP3cQ1W8HdT8PRz9nRx9XN2VQh29fV09vdzCXUO8Q9S8HUNCfL38XePVAiODA5x9Q0G6nEBiXr4uwTzMLCmJeYUp_JCaW4GBTfXEGcP3dSC_PjU4oLE5NS81JJ41wBjMyMTQ3MTR2NjIpQAANYCLM4</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>MULTIPLE ANGLES OF INCIDENCE SEMICONDUCTOR METROLOGY SYSTEMS AND METHODS</title><source>esp@cenet</source><creator>KRISHNAN, Shankar ; FILIP, Catalin ; BRADY, Gregory ; WANG, David Y ; FLOCK, Klaus ; ARAIN, Muzammil ; DE VEER, Johannes D ; SHCHEGROV, Andrei ; ROTTER, Lawrence D</creator><creatorcontrib>KRISHNAN, Shankar ; FILIP, Catalin ; BRADY, Gregory ; WANG, David Y ; FLOCK, Klaus ; ARAIN, Muzammil ; DE VEER, Johannes D ; SHCHEGROV, Andrei ; ROTTER, Lawrence D</creatorcontrib><description>An apparatus includes (i) a bright light source for providing an illumination beam at multiple wavelengths selectable with a range from a deep ultraviolet wavelength to an infrared wavelength, (ii) illumination optics for directing the illumination beam towards a sample at selectable sets of angles of incidence (AOI's) or azimuth angles (AZ's) and polarization states to provide spectroscopic ellipsometry, wherein the illumination optics include an apodizer for controlling a spot size of the illumination beam on the sample at each of the selectable AOI/AZ sets, (iii) collection optics for directing an output beam from the sample in response to the illumination beam at each of the selectable AOI/AZ sets and polarization states towards a detector that generates an output signal or image based on the output beam, and (v) a controller for characterizing a feature of the sample based on the output signal or image.</description><language>eng ; fre ; ger</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES ; MEASURING ; MEASURING ANGLES ; MEASURING AREAS ; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS ; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ; PHYSICS ; SEMICONDUCTOR DEVICES ; TESTING</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200603&DB=EPODOC&CC=EP&NR=3624174A3$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200603&DB=EPODOC&CC=EP&NR=3624174A3$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KRISHNAN, Shankar</creatorcontrib><creatorcontrib>FILIP, Catalin</creatorcontrib><creatorcontrib>BRADY, Gregory</creatorcontrib><creatorcontrib>WANG, David Y</creatorcontrib><creatorcontrib>FLOCK, Klaus</creatorcontrib><creatorcontrib>ARAIN, Muzammil</creatorcontrib><creatorcontrib>DE VEER, Johannes D</creatorcontrib><creatorcontrib>SHCHEGROV, Andrei</creatorcontrib><creatorcontrib>ROTTER, Lawrence D</creatorcontrib><title>MULTIPLE ANGLES OF INCIDENCE SEMICONDUCTOR METROLOGY SYSTEMS AND METHODS</title><description>An apparatus includes (i) a bright light source for providing an illumination beam at multiple wavelengths selectable with a range from a deep ultraviolet wavelength to an infrared wavelength, (ii) illumination optics for directing the illumination beam towards a sample at selectable sets of angles of incidence (AOI's) or azimuth angles (AZ's) and polarization states to provide spectroscopic ellipsometry, wherein the illumination optics include an apodizer for controlling a spot size of the illumination beam on the sample at each of the selectable AOI/AZ sets, (iii) collection optics for directing an output beam from the sample in response to the illumination beam at each of the selectable AOI/AZ sets and polarization states towards a detector that generates an output signal or image based on the output beam, and (v) a controller for characterizing a feature of the sample based on the output signal or image.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</subject><subject>MEASURING</subject><subject>MEASURING ANGLES</subject><subject>MEASURING AREAS</subject><subject>MEASURING IRREGULARITIES OF SURFACES OR CONTOURS</subject><subject>MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZPDwDfUJ8QzwcVVw9HP3cQ1W8HdT8PRz9nRx9XN2VQh29fV09vdzCXUO8Q9S8HUNCfL38XePVAiODA5x9Q0G6nEBiXr4uwTzMLCmJeYUp_JCaW4GBTfXEGcP3dSC_PjU4oLE5NS81JJ41wBjMyMTQ3MTR2NjIpQAANYCLM4</recordid><startdate>20200603</startdate><enddate>20200603</enddate><creator>KRISHNAN, Shankar</creator><creator>FILIP, Catalin</creator><creator>BRADY, Gregory</creator><creator>WANG, David Y</creator><creator>FLOCK, Klaus</creator><creator>ARAIN, Muzammil</creator><creator>DE VEER, Johannes D</creator><creator>SHCHEGROV, Andrei</creator><creator>ROTTER, Lawrence D</creator><scope>EVB</scope></search><sort><creationdate>20200603</creationdate><title>MULTIPLE ANGLES OF INCIDENCE SEMICONDUCTOR METROLOGY SYSTEMS AND METHODS</title><author>KRISHNAN, Shankar ; FILIP, Catalin ; BRADY, Gregory ; WANG, David Y ; FLOCK, Klaus ; ARAIN, Muzammil ; DE VEER, Johannes D ; SHCHEGROV, Andrei ; ROTTER, Lawrence D</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP3624174A33</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2020</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</topic><topic>MEASURING</topic><topic>MEASURING ANGLES</topic><topic>MEASURING AREAS</topic><topic>MEASURING IRREGULARITIES OF SURFACES OR CONTOURS</topic><topic>MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>KRISHNAN, Shankar</creatorcontrib><creatorcontrib>FILIP, Catalin</creatorcontrib><creatorcontrib>BRADY, Gregory</creatorcontrib><creatorcontrib>WANG, David Y</creatorcontrib><creatorcontrib>FLOCK, Klaus</creatorcontrib><creatorcontrib>ARAIN, Muzammil</creatorcontrib><creatorcontrib>DE VEER, Johannes D</creatorcontrib><creatorcontrib>SHCHEGROV, Andrei</creatorcontrib><creatorcontrib>ROTTER, Lawrence D</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KRISHNAN, Shankar</au><au>FILIP, Catalin</au><au>BRADY, Gregory</au><au>WANG, David Y</au><au>FLOCK, Klaus</au><au>ARAIN, Muzammil</au><au>DE VEER, Johannes D</au><au>SHCHEGROV, Andrei</au><au>ROTTER, Lawrence D</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>MULTIPLE ANGLES OF INCIDENCE SEMICONDUCTOR METROLOGY SYSTEMS AND METHODS</title><date>2020-06-03</date><risdate>2020</risdate><abstract>An apparatus includes (i) a bright light source for providing an illumination beam at multiple wavelengths selectable with a range from a deep ultraviolet wavelength to an infrared wavelength, (ii) illumination optics for directing the illumination beam towards a sample at selectable sets of angles of incidence (AOI's) or azimuth angles (AZ's) and polarization states to provide spectroscopic ellipsometry, wherein the illumination optics include an apodizer for controlling a spot size of the illumination beam on the sample at each of the selectable AOI/AZ sets, (iii) collection optics for directing an output beam from the sample in response to the illumination beam at each of the selectable AOI/AZ sets and polarization states towards a detector that generates an output signal or image based on the output beam, and (v) a controller for characterizing a feature of the sample based on the output signal or image.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS SEMICONDUCTOR DEVICES TESTING |
title | MULTIPLE ANGLES OF INCIDENCE SEMICONDUCTOR METROLOGY SYSTEMS AND METHODS |
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