METHOD AND METROLOGY APPARATUS FOR DETERMINING ESTIMATED SCATTERED RADIATION INTENSITY

METHOD AND METROLOGY APPARATUS FOR DETERMINING ESTIMATED SCATTERED RADIATION INTENSITY

A method of determining an estimated intensity of radiation scattered by a target illuminated by a radiation source, has the following steps: obtaining and training (402) a library REFLIB of wavelength-dependent reflectivity as a function of the wavelength, target structural parameters and angle of...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: DIRKS, Remco, SMILDE, Hendrik Jan Hidde, MOSSAVAT, Seyed Iman
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator DIRKS, Remco
SMILDE, Hendrik Jan Hidde
MOSSAVAT, Seyed Iman
description A method of determining an estimated intensity of radiation scattered by a target illuminated by a radiation source, has the following steps: obtaining and training (402) a library REFLIB of wavelength-dependent reflectivity as a function of the wavelength, target structural parameters and angle of incidence K(λ,θ,x,y); determining (408) a wide-band library (W-BLIB) of integrals of wavelength-dependent reflectivity R of the target in a Jones framework over a range of radiation source wavelengths λ; training (TRN) (410) the wide-band library; and determining (412), using the trained wide-band library, an estimated intensity (INT) of radiation scattered by the target illuminated by the radiation source.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP3611568A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP3611568A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP3611568A13</originalsourceid><addsrcrecordid>eNqNikEKwjAQAHPxIOof9gMeQrF4XZptu2A2IVmFnkqReBIt1P9jDz7A0wzDbM3Nk_bBAYqDVVO4hG4AjBET6jVDGxI4UkqehaUDysoelRzkBnXtqyV0jMpBgEVJMuuwN5vH9FzK4cedgZa06Y9lfo9lmad7eZXPSLGqrT3VZ7TVH8sXZQAwxg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>METHOD AND METROLOGY APPARATUS FOR DETERMINING ESTIMATED SCATTERED RADIATION INTENSITY</title><source>esp@cenet</source><creator>DIRKS, Remco ; SMILDE, Hendrik Jan Hidde ; MOSSAVAT, Seyed Iman</creator><creatorcontrib>DIRKS, Remco ; SMILDE, Hendrik Jan Hidde ; MOSSAVAT, Seyed Iman</creatorcontrib><description>A method of determining an estimated intensity of radiation scattered by a target illuminated by a radiation source, has the following steps: obtaining and training (402) a library REFLIB of wavelength-dependent reflectivity as a function of the wavelength, target structural parameters and angle of incidence K(λ,θ,x,y); determining (408) a wide-band library (W-BLIB) of integrals of wavelength-dependent reflectivity R of the target in a Jones framework over a range of radiation source wavelengths λ; training (TRN) (410) the wide-band library; and determining (412), using the trained wide-band library, an estimated intensity (INT) of radiation scattered by the target illuminated by the radiation source.</description><language>eng ; fre ; ger</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20200219&amp;DB=EPODOC&amp;CC=EP&amp;NR=3611568A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20200219&amp;DB=EPODOC&amp;CC=EP&amp;NR=3611568A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>DIRKS, Remco</creatorcontrib><creatorcontrib>SMILDE, Hendrik Jan Hidde</creatorcontrib><creatorcontrib>MOSSAVAT, Seyed Iman</creatorcontrib><title>METHOD AND METROLOGY APPARATUS FOR DETERMINING ESTIMATED SCATTERED RADIATION INTENSITY</title><description>A method of determining an estimated intensity of radiation scattered by a target illuminated by a radiation source, has the following steps: obtaining and training (402) a library REFLIB of wavelength-dependent reflectivity as a function of the wavelength, target structural parameters and angle of incidence K(λ,θ,x,y); determining (408) a wide-band library (W-BLIB) of integrals of wavelength-dependent reflectivity R of the target in a Jones framework over a range of radiation source wavelengths λ; training (TRN) (410) the wide-band library; and determining (412), using the trained wide-band library, an estimated intensity (INT) of radiation scattered by the target illuminated by the radiation source.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNikEKwjAQAHPxIOof9gMeQrF4XZptu2A2IVmFnkqReBIt1P9jDz7A0wzDbM3Nk_bBAYqDVVO4hG4AjBET6jVDGxI4UkqehaUDysoelRzkBnXtqyV0jMpBgEVJMuuwN5vH9FzK4cedgZa06Y9lfo9lmad7eZXPSLGqrT3VZ7TVH8sXZQAwxg</recordid><startdate>20200219</startdate><enddate>20200219</enddate><creator>DIRKS, Remco</creator><creator>SMILDE, Hendrik Jan Hidde</creator><creator>MOSSAVAT, Seyed Iman</creator><scope>EVB</scope></search><sort><creationdate>20200219</creationdate><title>METHOD AND METROLOGY APPARATUS FOR DETERMINING ESTIMATED SCATTERED RADIATION INTENSITY</title><author>DIRKS, Remco ; SMILDE, Hendrik Jan Hidde ; MOSSAVAT, Seyed Iman</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP3611568A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2020</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>DIRKS, Remco</creatorcontrib><creatorcontrib>SMILDE, Hendrik Jan Hidde</creatorcontrib><creatorcontrib>MOSSAVAT, Seyed Iman</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>DIRKS, Remco</au><au>SMILDE, Hendrik Jan Hidde</au><au>MOSSAVAT, Seyed Iman</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METHOD AND METROLOGY APPARATUS FOR DETERMINING ESTIMATED SCATTERED RADIATION INTENSITY</title><date>2020-02-19</date><risdate>2020</risdate><abstract>A method of determining an estimated intensity of radiation scattered by a target illuminated by a radiation source, has the following steps: obtaining and training (402) a library REFLIB of wavelength-dependent reflectivity as a function of the wavelength, target structural parameters and angle of incidence K(λ,θ,x,y); determining (408) a wide-band library (W-BLIB) of integrals of wavelength-dependent reflectivity R of the target in a Jones framework over a range of radiation source wavelengths λ; training (TRN) (410) the wide-band library; and determining (412), using the trained wide-band library, an estimated intensity (INT) of radiation scattered by the target illuminated by the radiation source.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng ; fre ; ger
recordid cdi_epo_espacenet_EP3611568A1
source esp@cenet
subjects APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
title METHOD AND METROLOGY APPARATUS FOR DETERMINING ESTIMATED SCATTERED RADIATION INTENSITY
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-06T23%3A50%3A33IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=DIRKS,%20Remco&rft.date=2020-02-19&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EEP3611568A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true