APPARATUS, METHOD AND SYSTEM FOR MEASURING THE INFLUENCE OF OPHTHALMIC LENS DESIGN

A method for measuring an influence of an ophthalmic lens design is disclosed. The method comprises splitting an optical light beam into a wavefront measurement light path and a wavefront modulation light path; implementing the ophthalmic lens design in an adaptive optics device positioned in the wa...

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Bibliographische Detailangaben
Hauptverfasser:	DAVIS, Brett Ashley, YI, Fan, COLLINS, Michael John
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	DIAGNOSIS HUMAN NECESSITIES HYGIENE IDENTIFICATION MEDICAL OR VETERINARY SCIENCE OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHYSICS SURGERY
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Beschreibung
Zusammenfassung:	A method for measuring an influence of an ophthalmic lens design is disclosed. The method comprises splitting an optical light beam into a wavefront measurement light path and a wavefront modulation light path; implementing the ophthalmic lens design in an adaptive optics device positioned in the wavefront modulation light path; and obtaining ocular biometric data in the ocular biometric and wavefront measurement light path to measure the influence of the ophthalmic lens design. Also disclosed are an apparatus and a system for measuring an influence of an ophthalmic lens design along with a method for assembling the device and system. The ocular biometric device may be an interferometer and the adaptive optics device may comprise one or more wavefront shapers.