SUB-NANOMETER-LEVEL SUBSTRATE CLEANING MECHANISM
Various embodiments comprise apparatuses for cleaning and drying a substrate and methods of operating the apparatuses. In one embodiment, an exemplary apparatus includes a vertical substrate holder to hold and rotate the substrate at various speeds. An inner shield and an outer shield, when in a clo...
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| creator | RANDHAWA, Rubinder S CHRISTOV, Harry |
| description | Various embodiments comprise apparatuses for cleaning and drying a substrate and methods of operating the apparatuses. In one embodiment, an exemplary apparatus includes a vertical substrate holder to hold and rotate the substrate at various speeds. An inner shield and an outer shield, when in a closed position, surround the vertical substrate holder during operation of the apparatus. Each of the inner shield and the outer shield can operate independently in at least one of rotational speed and direction from the other shield. A front-side spray jet and a back-side spray jet are arranged to spray at least one fluid onto both sides of the substrate and edges of the substrate substantially concurrently. A gas flow, combined with a high rotational-speed of the shields and substrate, assist in drying the substrate. Additional apparatuses and methods of forming the apparatuses are disclosed. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP3577680A4</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP3577680A4</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP3577680A43</originalsourceid><addsrcrecordid>eNrjZDAIDnXS9XP08_d1DXEN0vVxDXP1UQCKBYcEOYa4Kjj7uDr6efq5K_i6OnsAWcG-PAysaYk5xam8UJqbQcHNNcTZQze1ID8-tbggMTk1L7Uk3jXA2NTc3MzCwNHEmAglAPsHJiU</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>SUB-NANOMETER-LEVEL SUBSTRATE CLEANING MECHANISM</title><source>esp@cenet</source><creator>RANDHAWA, Rubinder S ; CHRISTOV, Harry</creator><creatorcontrib>RANDHAWA, Rubinder S ; CHRISTOV, Harry</creatorcontrib><description>Various embodiments comprise apparatuses for cleaning and drying a substrate and methods of operating the apparatuses. In one embodiment, an exemplary apparatus includes a vertical substrate holder to hold and rotate the substrate at various speeds. An inner shield and an outer shield, when in a closed position, surround the vertical substrate holder during operation of the apparatus. Each of the inner shield and the outer shield can operate independently in at least one of rotational speed and direction from the other shield. A front-side spray jet and a back-side spray jet are arranged to spray at least one fluid onto both sides of the substrate and edges of the substrate substantially concurrently. A gas flow, combined with a high rotational-speed of the shields and substrate, assist in drying the substrate. Additional apparatuses and methods of forming the apparatuses are disclosed.</description><language>eng ; fre ; ger</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20201125&DB=EPODOC&CC=EP&NR=3577680A4$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20201125&DB=EPODOC&CC=EP&NR=3577680A4$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>RANDHAWA, Rubinder S</creatorcontrib><creatorcontrib>CHRISTOV, Harry</creatorcontrib><title>SUB-NANOMETER-LEVEL SUBSTRATE CLEANING MECHANISM</title><description>Various embodiments comprise apparatuses for cleaning and drying a substrate and methods of operating the apparatuses. In one embodiment, an exemplary apparatus includes a vertical substrate holder to hold and rotate the substrate at various speeds. An inner shield and an outer shield, when in a closed position, surround the vertical substrate holder during operation of the apparatus. Each of the inner shield and the outer shield can operate independently in at least one of rotational speed and direction from the other shield. A front-side spray jet and a back-side spray jet are arranged to spray at least one fluid onto both sides of the substrate and edges of the substrate substantially concurrently. A gas flow, combined with a high rotational-speed of the shields and substrate, assist in drying the substrate. Additional apparatuses and methods of forming the apparatuses are disclosed.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDAIDnXS9XP08_d1DXEN0vVxDXP1UQCKBYcEOYa4Kjj7uDr6efq5K_i6OnsAWcG-PAysaYk5xam8UJqbQcHNNcTZQze1ID8-tbggMTk1L7Uk3jXA2NTc3MzCwNHEmAglAPsHJiU</recordid><startdate>20201125</startdate><enddate>20201125</enddate><creator>RANDHAWA, Rubinder S</creator><creator>CHRISTOV, Harry</creator><scope>EVB</scope></search><sort><creationdate>20201125</creationdate><title>SUB-NANOMETER-LEVEL SUBSTRATE CLEANING MECHANISM</title><author>RANDHAWA, Rubinder S ; CHRISTOV, Harry</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP3577680A43</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2020</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>RANDHAWA, Rubinder S</creatorcontrib><creatorcontrib>CHRISTOV, Harry</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>RANDHAWA, Rubinder S</au><au>CHRISTOV, Harry</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>SUB-NANOMETER-LEVEL SUBSTRATE CLEANING MECHANISM</title><date>2020-11-25</date><risdate>2020</risdate><abstract>Various embodiments comprise apparatuses for cleaning and drying a substrate and methods of operating the apparatuses. In one embodiment, an exemplary apparatus includes a vertical substrate holder to hold and rotate the substrate at various speeds. An inner shield and an outer shield, when in a closed position, surround the vertical substrate holder during operation of the apparatus. Each of the inner shield and the outer shield can operate independently in at least one of rotational speed and direction from the other shield. A front-side spray jet and a back-side spray jet are arranged to spray at least one fluid onto both sides of the substrate and edges of the substrate substantially concurrently. A gas flow, combined with a high rotational-speed of the shields and substrate, assist in drying the substrate. Additional apparatuses and methods of forming the apparatuses are disclosed.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng ; fre ; ger |
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| subjects | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES |
| title | SUB-NANOMETER-LEVEL SUBSTRATE CLEANING MECHANISM |
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