A THIN PLASTIC POLISHING ARTICLE FOR CMP APPLICATIONS

A method and apparatus for polishing a substrate that includes a polishing article comprising a polymeric sheet having a raised surface texture, which is formed on the surface of the polymeric sheet is provided. According to one or more implementations of the present disclosure, an advanced polishin...

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Hauptverfasser: WANG, You, MENK, Gregory E, TRAN, Huyen Karen, GURUSAMY, Jay, KAKIREDDY, Veera Raghava Reddy, REDEKER, Fred C, TOLLES, Robert D, MIKHAYLICHENKO, Ekaterina, DAVEY, Eric
Format: Patent
Sprache:eng ; fre ; ger
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