FREE ELECTRON LASER AND METHOD OF GENERATING AN EUV RADIATION BEAM USING THE SAME

A method of patterning lithographic substrates, the method comprising using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctu...

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Hauptverfasser: LOOPSTRA, Erik Roelof, NIKIPELOV, Andrey, DE JAGER, Pieter Willem Herman, GRIMMINCK, Leonardus Adrianus Gerardus, ENGELEN, Wouter Joep, DONKER, Rilpho Ludovicus, NIENHUYS, Han-Kwang, BANINE, Vadim Yevgenyevich, LITVINENKO, Vladimir, FRIJNS, Olav Waldemar Vladimir, AKKERMANS, Johannes Antonius Gerardus, DE VRIES, Gosse Charles, LUITEN, Otger Jan, KRUIZINGA, Borgert
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creator LOOPSTRA, Erik Roelof
NIKIPELOV, Andrey
DE JAGER, Pieter Willem Herman
GRIMMINCK, Leonardus Adrianus Gerardus
ENGELEN, Wouter Joep
DONKER, Rilpho Ludovicus
NIENHUYS, Han-Kwang
BANINE, Vadim Yevgenyevich
LITVINENKO, Vladimir
FRIJNS, Olav Waldemar Vladimir
AKKERMANS, Johannes Antonius Gerardus
DE VRIES, Gosse Charles
LUITEN, Otger Jan
KRUIZINGA, Borgert
description A method of patterning lithographic substrates, the method comprising using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.
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language eng ; fre ; ger
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subjects APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
COLORIMETRY
DEVICES USING STIMULATED EMISSION
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
GAMMA RAY OR X-RAY MICROSCOPES
HOLOGRAPHY
IRRADIATION DEVICES
MATERIALS THEREFOR
MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT
MEASURING
NUCLEAR ENGINEERING
NUCLEAR PHYSICS
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
PLASMA TECHNIQUE
PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS
PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
RADIATION PYROMETRY
TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR
TESTING
title FREE ELECTRON LASER AND METHOD OF GENERATING AN EUV RADIATION BEAM USING THE SAME
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