PROCESS FOR DEPOSITING A LAYER

A process for depositing on a surface of a substrate a layer based on a metal oxide doped with magnesium or a mixed metal oxide containing magnesium,said process comprising:providing a substrate having a surface,forming a gaseous mixture comprising a non-halogenated source of a metal and a source of...

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Bibliographische Detailangaben
Hauptverfasser:	HARRIS, Peter Michael, DAHAL, Lila Raj, SANDERSON, Kevin David, PALMER, Liam Sonie, NI, Jun, NICHOL, Gary Robert, Brown, Jack
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A process for depositing on a surface of a substrate a layer based on a metal oxide doped with magnesium or a mixed metal oxide containing magnesium,said process comprising:providing a substrate having a surface,forming a gaseous mixture comprising a non-halogenated source of a metal and a source of magnesium,delivering the gaseous mixture to the surface of the substrate, anddepositing the layer based on a metal oxide doped with magnesium or a mixed metal oxide containing magnesium on the surface of the substrate.